Invention Grant
- Patent Title: Spot array substrate, method for producing same, and nucleic acid polymer analysis method and device
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Application No.: US15529122Application Date: 2015-10-07
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Publication No.: US11130985B2Publication Date: 2021-09-28
- Inventor: Naoshi Itabashi , Sonoko Migitaka , Masatoshi Narahara , Tomohiro Shoji , Yukio Ono
- Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
- Applicant Address: JP Tokyo
- Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION
- Current Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Mattingly & Malur, PC
- Priority: JPJP2014-240434 20141127
- International Application: PCT/JP2015/078479 WO 20151007
- International Announcement: WO2016/084489 WO 20160602
- Main IPC: C12Q1/68
- IPC: C12Q1/68 ; C12Q1/6809 ; B01J19/00 ; C12Q1/6806 ; C12Q1/6874 ; G01N35/00 ; G01N35/10 ; B32B27/32 ; C08G77/50
Abstract:
In order to reduce the cost of producing a spot array substrate and reduce the cost of nucleic acid polymer analysis, a spot array substrate is used which is produced by preparing a resin substrate 402 having a surface on which an uneven pattern is formed and a plurality of bead sitting positions set in a two-dimensional array within the uneven pattern, and loading surface-modified beads onto the bead sitting positions of the resin substrate.
Public/Granted literature
- US20170260573A1 SPOT ARRAY SUBSTRATE, METHOD FOR PRODUCING SAME, AND NUCLEIC ACID POLYMER ANALYSIS METHOD AND DEVICE Public/Granted day:2017-09-14
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