Invention Application
- Patent Title: POLISHING COMPOSITION, POLISHING METHOD, AND METHOD FOR MANUFACTURING CERAMIC COMPONENT
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Application No.: US15538432Application Date: 2015-11-26
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Publication No.: US20170355881A1Publication Date: 2017-12-14
- Inventor: Kazusei TAMAI , Shingo OTSUKI , Tomoya IKEDO , Shota HISHIDA , Hiroshi ASANO , Maiko ASAI , Yuuichi ITO
- Applicant: FUJIMI INCORPORATED
- Applicant Address: JP Kiyosu-shi, Aichi
- Assignee: FUJIMI INCORPORATED
- Current Assignee: FUJIMI INCORPORATED
- Current Assignee Address: JP Kiyosu-shi, Aichi
- Priority: JP2014-265059 20141226
- International Application: PCT/JP2015/005880 WO 20151126
- Main IPC: C09G1/02
- IPC: C09G1/02 ; C09K3/14
Abstract:
Provided is a polishing composition that is produced at low cost and can impart high-grade mirror finishing to ceramic. The polishing composition includes abrasives, has a pH of 6.0 or more to 9.0 or less, and is used for polishing ceramic.
Information query
