公开(公告)号：US20210347007A1

公开(公告)日：2021-11-11

申请号：US17280607

申请日：2019-09-12

申请人： FUJIMI INCORPORATED

发明人： Kyosuke TENKO ,  Shota HISHIDA ,  Daisuke YASUI ,  Hideharu HASE ,  Toru KAMADA

IPC分类号： B24B37/24 ,  B24B37/22 ,  B24B37/26

摘要： There are provided a polishing pad and a polishing method using the same that are useful for removing the surface waviness of a curved resin-painted surface at a high polishing removal rate. A polishing pad (10) according to one aspect of the present invention includes a layer having a polishing surface (30). The layer having the polishing surface (30) has a sparse and dense structure in which a proportion of a sparse portion of the polishing surface (30) is 52% or more and 96% or less, and is composed of a sheet material having an A hardness of 70 or more measured according to JIS K 6253.

公开(公告)号：US20190119523A1

公开(公告)日：2019-04-25

申请号：US16089144

申请日：2017-03-23

申请人： FUJIMI INCORPORATED

发明人： Shuichi TAMADA ,  Hitoshi MORINAGA ,  Shota HISHIDA ,  Daisuke YASUI

IPC分类号： C09G1/02 ,  B24B1/00

摘要： Provided are a polishing composition, in which oxidation of magnetic particles hardly occurs, and a magnetic polishing method. The polishing composition (1) contains magnetic particles, an antioxidant for suppressing oxidation of the magnetic particles, and water. A magnetic field is applied to the polishing composition (1) to form a magnetic cluster (3) that contains the magnetic particles, and the magnetic cluster (3) is brought into contact with an object (5) to be polished, to polish the object (5) to be polished.

公开(公告)号：US20170355882A1

公开(公告)日：2017-12-14

申请号：US15538475

申请日：2015-11-26

申请人： FUJIMI INCORPORATED

发明人： Shingo OTSUKI ,  Tomoya IKEDO ,  Shota HISHIDA ,  Hitoshi MORINAGA ,  Maiko ASAI ,  Yuuichi ITO

IPC分类号： C09G1/02 ,  C04B41/91 ,  C09K3/14

CPC分类号： C09G1/02 ,  B24B37/00 ,  B24B37/044 ,  C04B41/91 ,  C09K3/1409 ,  C09K3/1463

摘要： Provided is a polishing composition that is produced at low cost and can impart high-grade mirror finishing to ceramic. The polishing composition includes abrasives made of carbide, and is used for polishing ceramic.

公开(公告)号：US20170355881A1

公开(公告)日：2017-12-14

申请号：US15538432

申请日：2015-11-26

申请人： FUJIMI INCORPORATED

发明人： Kazusei TAMAI ,  Shingo OTSUKI ,  Tomoya IKEDO ,  Shota HISHIDA ,  Hiroshi ASANO ,  Maiko ASAI ,  Yuuichi ITO

IPC分类号： C09G1/02 ,  C09K3/14

CPC分类号： C09G1/02 ,  B24B37/00 ,  C09G1/00 ,  C09K3/14 ,  C09K3/1463

摘要： Provided is a polishing composition that is produced at low cost and can impart high-grade mirror finishing to ceramic. The polishing composition includes abrasives, has a pH of 6.0 or more to 9.0 or less, and is used for polishing ceramic.