Invention Application
- Patent Title: METHOD OF FILLING A VIA HOLE AND APPARATUS FOR PERFORMING THE SAME
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Application No.: US15841518Application Date: 2017-12-14
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Publication No.: US20180182669A1Publication Date: 2018-06-28
- Inventor: Yoon Ki SA , Mong Ryong Lee
- Applicant: SEMES CO., LTD.
- Applicant Address: KR Cheonan-si
- Assignee: SEMES CO., LTD.
- Current Assignee: SEMES CO., LTD.
- Current Assignee Address: KR Cheonan-si
- Priority: KR10-2016-0180171 20161227; KR10-2017-0025833 20170228
- Main IPC: H01L21/768
- IPC: H01L21/768 ; H01L21/288 ; H01L23/48 ; C25D13/12

Abstract:
A method of filling a via hole and an apparatus for performing the same are disclosed. The method includes providing a filling material having a fluidity on a via hole formed in the substrate, forming an electric field through the substrate to fill the via hole with the filling material, and solidifying the filling material in the via hole. The apparatus includes a stage for supporting the substrate, upper and lower electrodes for forming the electric field, and a power supply connected with the upper and lower electrodes.
Public/Granted literature
- US10777458B2 Method of filling a via hole and apparatus for performing the same Public/Granted day:2020-09-15
Information query
IPC分类: