Invention Application
- Patent Title: GALLIUM NITRIDE SINTERED BODY OR GALLIUM NITRIDE MOLDED ARTICLE, AND METHOD FOR PRODUCING SAME
-
Application No.: US16206346Application Date: 2018-11-30
-
Publication No.: US20190106784A1Publication Date: 2019-04-11
- Inventor: Masami MESUDA , Keitaro MATSUMARU , Koyata TAKAHASHI , Ryou KIKUCHI , Tetsuo SHIBUTAMI
- Applicant: TOSOH CORPORATION
- Applicant Address: JP Yamaguchi
- Assignee: TOSOH CORPORATION
- Current Assignee: TOSOH CORPORATION
- Current Assignee Address: JP Yamaguchi
- Priority: JP2010-283165 20101220; JP2010-284631 20101221
- Main IPC: C23C14/34
- IPC: C23C14/34 ; C22C29/16 ; H01J37/34 ; C04B35/58 ; C04B35/626 ; C04B41/88 ; C04B35/645 ; C04B37/02 ; C04B41/00 ; C04B41/51

Abstract:
The present invention provides a gallium nitride sintered body and a gallium nitride molded article which have high density and low oxygen content without using a special apparatus. According to the first embodiment, a gallium nitride sintered body, which is characterized by having density of 2.5 g/cm3 to less than 5.0 g/cm3 and an intensity ratio of the gallium oxide peak of the (002) plane to the gallium nitride peak of the (002) plane of less than 3%, which is determined by X-ray diffraction analysis, can be obtained. According to the second embodiment, a metal gallium-impregnated gallium nitride molded article, which is characterized by comprising a gallium nitride phase and a metal gallium phase that exist as separate phases and having a molar ratio, Ga/(Ga+N), of 55% to 80%, can be obtained.
Public/Granted literature
- US11168393B2 Gallium nitride sintered body or gallium nitride molded article, and method for producing same Public/Granted day:2021-11-09
Information query
IPC分类: