Invention Application
- Patent Title: ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND RESIN
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Application No.: US16953305Application Date: 2020-11-19
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Publication No.: US20210072642A1Publication Date: 2021-03-11
- Inventor: Daisuke ASAKAWA , Akiyoshi GOTO , Masafumi KOJIMA , Takashi KAWASHIMA , Yasufumi OISHI , Keita KATO
- Applicant: FUJIFILM Corporation
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Priority: JP2018-128916 20180706
- Main IPC: G03F7/039
- IPC: G03F7/039 ; G03F7/038 ; C08F20/18 ; C08F26/06
Abstract:
An actinic ray-sensitive or radiation-sensitive resin composition includes a resin including a repeating unit represented by Formula (1) and capable of increasing a polarity by an action of an acid.
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