公开(公告)号：US20210011378A1

公开(公告)日：2021-01-14

申请号：US17031067

申请日：2020-09-24

申请人： FUJIFILM Corporation

发明人： Kei YAMAMOTO ,  Yasufumi OISHI ,  Noahiro TANGO ,  Hidenori TAKAHASHI

IPC分类号： G03F7/027 ,  G03F7/004 ,  C08L33/06 ,  C08L33/14

摘要： A photosensitive resin composition including an ethylenically unsaturated compound, a resin having a polarity that increases by the action of an acid, and metal atoms, in which a total content of the metal atoms is from 1 ppt to 30 ppb with respect to a total mass of the photosensitive resin composition, and a content of the ethylenically unsaturated compound is from 0.0001% by mass to 1% by mass with respect to the total mass of the photosensitive resin composition, and a method for producing the same; and a resist film, a pattern forming method, and a method for manufacturing an electronic device, each of which uses the photosensitive resin composition.

公开(公告)号：US20210072642A1

公开(公告)日：2021-03-11

申请号：US16953305

申请日：2020-11-19

申请人： FUJIFILM Corporation

发明人： Daisuke ASAKAWA ,  Akiyoshi GOTO ,  Masafumi KOJIMA ,  Takashi KAWASHIMA ,  Yasufumi OISHI ,  Keita KATO

IPC分类号： G03F7/039 ,  G03F7/038 ,  C08F20/18 ,  C08F26/06

摘要： An actinic ray-sensitive or radiation-sensitive resin composition includes a resin including a repeating unit represented by Formula (1) and capable of increasing a polarity by an action of an acid.