公开(公告)号：US20190294042A1

公开(公告)日：2019-09-26

申请号：US16432043

申请日：2019-06-05

申请人： FUJIFILM Corporation

发明人： Keita KATO ,  Kyohei SAKITA ,  Daisuke ASAKAWA ,  Akiyoshi GOTO ,  Masafumi KOJIMA

IPC分类号： G03F7/038 ,  G03F7/004

摘要： Provided are an actinic ray-sensitive or radiation-sensitive resin composition which satisfies a relational expression represented by a specific formula in a case where an exposure latitude is represented by EL and an normalized image log slope is represented by NILS, in which the actinic ray-sensitive or radiation-sensitive resin composition can provide very excellent roughness performance, exposure latitude, and depth of focus, particularly, in the formation of an ultrafine pattern (for example, a contact hole pattern having a hole diameter of 45 nm or less, or a line-and-space pattern having a line width of 45 nm or less); and an actinic ray-sensitive or radiation-sensitive film, a pattern forming method, and a method for manufacturing an electronic device, each using the actinic ray-sensitive or radiation-sensitive resin composition.

公开(公告)号：US20210318616A1

公开(公告)日：2021-10-14

申请号：US17344967

申请日：2021-06-11

申请人： FUJIFILM Corporation

发明人： Daisuke ASAKAWA ,  Takashi KAWASHIMA ,  Akiyoshi GOTO ,  Michihiro SHIRAKAWA ,  Kei YAMAMOTO

IPC分类号： G03F7/039 ,  G03F7/004 ,  G03F7/20 ,  G03F7/40 ,  G03F7/32

摘要： According to the present invention, an actinic ray-sensitive or radiation-sensitive resin composition including a resin P having a repeating unit represented by General Formula (P1) and a compound that generates an acid having a pKa of −1.40 or more upon irradiation with actinic rays or radiation; and a resist film, a pattern forming method, and a method for manufacturing an electronic device, each using the composition, are provided. Mp represents a single bond or a divalent linking group. Lp represents a divalent linking group. Xp represents O, S, or NRN1. RN1 represents a hydrogen atom or a monovalent organic group. Rp represents a monovalent organic group.

公开(公告)号：US20210072642A1

公开(公告)日：2021-03-11

申请号：US16953305

申请日：2020-11-19

申请人： FUJIFILM Corporation

发明人： Daisuke ASAKAWA ,  Akiyoshi GOTO ,  Masafumi KOJIMA ,  Takashi KAWASHIMA ,  Yasufumi OISHI ,  Keita KATO

IPC分类号： G03F7/039 ,  G03F7/038 ,  C08F20/18 ,  C08F26/06

摘要： An actinic ray-sensitive or radiation-sensitive resin composition includes a resin including a repeating unit represented by Formula (1) and capable of increasing a polarity by an action of an acid.

公开(公告)号：US20210191265A1

公开(公告)日：2021-06-24

申请号：US17193007

申请日：2021-03-05

申请人： FUJIFILM Corporation

发明人： Kazunari YAGI ,  Michihiro OGAWA ,  Akiyoshi GOTO ,  Daisuke ASAKAWA

IPC分类号： G03F7/039 ,  G03F7/038 ,  G03F7/004 ,  C08F220/28 ,  C08F212/14

摘要： The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition which is excellent in the sensitivity of a resist film to be formed to EUV and excellent in the LER of a positive tone pattern to be formed upon EUV exposure. In addition, the present invention provides a resist film, a pattern forming method, and a method for manufacturing an electronic device, each of which uses the actinic ray-sensitive or radiation-sensitive resin composition.
The actinic ray-sensitive or radiation-sensitive resin composition of an embodiment of the present invention includes a compound that generates an acid upon irradiation with actinic rays or radiation, and a resin having a polarity that increases by an action of an acid, in which the resin includes a repeating unit represented by General Formula (B-1).

公开(公告)号：US20190196326A1

公开(公告)日：2019-06-27

申请号：US16286984

申请日：2019-02-27

申请人： FUJIFILM Corporation

发明人： Masafumi KOJIMA ,  Daisuke ASAKAWA ,  Akiyoshi GOTO ,  Keita KATO ,  Keiyu OU

IPC分类号： G03F7/004 ,  G03F7/20 ,  C07C309/17 ,  C07C309/16 ,  C07C309/19 ,  C07C309/07 ,  C07C317/06 ,  C07C317/12 ,  C07D295/185 ,  G03F7/32

CPC分类号： G03F7/0045 ,  C07C309/07 ,  C07C309/16 ,  C07C309/17 ,  C07C309/19 ,  C07C317/06 ,  C07C317/12 ,  C07C2601/14 ,  C07C2603/74 ,  C07D295/185 ,  G03F7/004 ,  G03F7/0046 ,  G03F7/038 ,  G03F7/039 ,  G03F7/20 ,  G03F7/2004 ,  G03F7/32

摘要： An actinic ray-sensitive or radiation-sensitive resin composition contains a compound that generates an acid represented by Formula (I) by irradiation with an actinic ray or radiation, and a resin. The resist film is formed of the actinic ray-sensitive or radiation-sensitive resin composition. In the pattern forming method and the method of manufacturing an electronic device, the actinic ray-sensitive or radiation-sensitive resin composition is used.

公开(公告)号：US20180292751A1

公开(公告)日：2018-10-11

申请号：US16007421

申请日：2018-06-13

申请人： FUJIFILM Corporation

发明人： Daisuke ASAKAWA ,  Akiyoshi GOTO ,  Yasunori YONEKUTA ,  Naoya HATAKEYAMA ,  Michihiro SHIRAKAWA ,  Keiyu OU

IPC分类号： G03F7/038 ,  G03F7/16 ,  G03F7/20 ,  G03F7/38 ,  G03F7/32 ,  C08F220/16 ,  C08F220/28 ,  C08F220/36 ,  C08F220/38 ,  C08F220/34 ,  C08F230/08 ,  G03F7/039

摘要： The present invention has an object to provide an actinic ray-sensitive or radiation-sensitive resin composition having excellent collapse performance, an actinic ray-sensitive or radiation-sensitive film formed using the composition, a pattern forming method using the composition, and a method for manufacturing an electronic device, including the pattern forming method. The actinic ray-sensitive or radiation-sensitive resin composition of the present invention is an actinic ray-sensitive or radiation-sensitive resin composition containing a resin whose solubility with respect to a developer changes by the action of an acid, in which the resin includes a repeating unit derived from a monomer having at least one of a lactone structure or an amide structure, and the dissolution parameter of the monomer is 24.0 or more.