- 专利标题: ELECTRONIC SUBSTRATES HAVING EMBEDDED INDUCTORS
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申请号: US17029870申请日: 2020-09-23
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公开(公告)号: US20220093316A1公开(公告)日: 2022-03-24
- 发明人: Benjamin Duong , Michael Garelick , Darko Grujicic , Tarek Ibrahim , Brandon C. Marin , Sai Vadlamani , Marcel Wall
- 申请人: Intel Corporation
- 申请人地址: US CA Santa Clara
- 专利权人: Intel Corporation
- 当前专利权人: Intel Corporation
- 当前专利权人地址: US CA Santa Clara
- 主分类号: H01F27/28
- IPC分类号: H01F27/28 ; H01L23/64 ; H01F41/32 ; H01L23/498
摘要:
An electronic substrate may be fabricated by forming a base substrate and forming an inductor extending through the base substrate, wherein the inductor includes a magnetic material layer and a barrier layer, such that the barrier layer prevents the magnetic material layer from leaching into plating solutions during the fabrication of the electronic substrate. In one embodiment, the barrier material may comprise titanium. In another embodiment, the barrier layer may comprise a polymeric material. In still another embodiment, the barrier layer may comprise a nitride material layer. The inductor may further include a plating seed layer on the barrier layer and a conductive fill material abutting the plating seed layer.
公开/授权文献
- US12057252B2 Electronic substrates having embedded inductors 公开/授权日:2024-08-06
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