Invention Application
- Patent Title: ELECTROSTATIC CHUCK AND METHOD FOR MANUFACTURING THE SAME
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Application No.: US17383679Application Date: 2021-07-23
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Publication No.: US20220216085A1Publication Date: 2022-07-07
- Inventor: Yung-Hsiang HUANG , Wei-Cheng TANG , Yi-Che SU , Wen-Pin CHUANG , Su-Mei CHEN WEI , Ya-Tin YU , Yun-Shan HUANG
- Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
- Applicant Address: TW Hsinchu
- Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
- Current Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
- Current Assignee Address: TW Hsinchu
- Priority: TW110100634 20210107
- Main IPC: H01L21/683
- IPC: H01L21/683 ; C04B41/45 ; C01G23/04 ; C04B35/10 ; C04B35/581

Abstract:
An electrostatic chuck is provided, the electrostatic chuck includes a base; and an insulating layer, an electrode layer, a first dielectric layer, and a second dielectric layer sequentially stacked on the base. The first dielectric layer is aluminum oxide (Al2O3) or aluminum nitride (AlN). A material of the second dielectric layer is different from a material of the first dielectric layer, and the second dielectric layer includes titanium element, IVA group element, and oxygen element.
Information query
IPC分类: