Invention Application
- Patent Title: PROCESSING METHOD AND PROCESSING APPARATUS
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Application No.: US17657962Application Date: 2022-04-05
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Publication No.: US20220328343A1Publication Date: 2022-10-13
- Inventor: Takuya UMISE , Masato SHINADA , Tetsuya MIYASHITA
- Applicant: Tokyo Electron Limited
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Priority: JP2021-067478 20210413
- Main IPC: H01L21/687
- IPC: H01L21/687

Abstract:
A processing method for processing a substrate includes: a first arrangement step of mounting, on a stage provided in a processing container to mount the substrate on the stage, a plate-shaped protective member which is prepared in advance at a location in the processing container different from a location on the stage and which is configured to protect an upper surface of the stage; an adjustment step of adjusting a distance between the stage and an annular cover member provided above an edge portion of the stage to a second distance different from a first distance between the stage and the cover member when the substrate is processed; and a pretreatment step of performing a pretreatment in the processing container to change a state in the processing container to a predetermined state, wherein the protective member has a thickness different from a thickness of the substrate.
Public/Granted literature
- US12261078B2 Processing method and processing apparatus Public/Granted day:2025-03-25
Information query
IPC分类: