Invention Publication
- Patent Title: SUBSTRATE PROCESSING APPARATUS AND IMAGE CAPTURING METHOD
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Application No.: US17889624Application Date: 2022-08-17
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Publication No.: US20230154776A1Publication Date: 2023-05-18
- Inventor: Tadashi ENOMOTO , Nao AKASHI , Yutai MATSUHASHI , Masakazu YAMAMOTO
- Applicant: Tokyo Electron Limited
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Priority: JP 21133061 2021.08.18
- Main IPC: H01L21/673
- IPC: H01L21/673 ; H01L21/68

Abstract:
A substrate processing apparatus includes: a chamber that accommodates a boat; a transfer mechanism that is provided inside the chamber, and transfers a substrate; a first camera that captures an image of a support column of the boat and the substrate; a support member that is inserted through an opening formed in a wall surface of the chamber, and supports the first camera; and a driver that drives the support member in order to move the first camera between a standby position and a measurement position.
Public/Granted literature
- US12230523B2 Substrate processing apparatus and image capturing method Public/Granted day:2025-02-18
Information query
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