Invention Publication
- Patent Title: TRANSISTOR DEVICES WITH HIGH-K PEROVSKITE GATE DIELECTRICS
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Application No.: US17666627Application Date: 2022-02-08
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Publication No.: US20230253476A1Publication Date: 2023-08-10
- Inventor: Arnab Sen Gupta , Abhishek A. Sharma , Matthew V. Metz , Kaan Oguz , Urusa Shahriar Alaan , Scott B. Clendenning , Van H. Le , Chia-Ching Lin , Jason C. Retasket , Edward O. Johnson, JR.
- Applicant: Intel Corporation
- Applicant Address: US CA Santa Clara
- Assignee: Intel Corporation
- Current Assignee: Intel Corporation
- Current Assignee Address: US CA Santa Clara
- Main IPC: H01L29/51
- IPC: H01L29/51 ; H01L29/423 ; H01L29/06 ; H01L27/108 ; H01L29/78 ; H01L29/49

Abstract:
Described herein are transistor devices formed using perovskite gate dielectrics. In one example, a transistor includes a high-k perovskite dielectric material between a gate electrode and a thin film semiconductor channel. In another example, four-terminal transistor includes a semiconductor channel, a gate stack that includes a perovskite dielectric layer on one side of the channel, and a body electrode on an opposite side of the channel. The body electrode adjusts a threshold voltage of the transistor.
Public/Granted literature
- US1721220A Bumper Public/Granted day:1929-07-16
Information query
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