发明公开
- 专利标题: NITRIDE SEMICONDUCTOR BUFFER STRUCTURE AND SEMICONDUCTOR DEVICE INCLUDING THE SAME
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申请号: US18306341申请日: 2023-04-25
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公开(公告)号: US20230343830A1公开(公告)日: 2023-10-26
- 发明人: Boram KIM , Jongseob KIM , Woochul JEON , Joonyong KIM , Junhyuk PARK , Jaejoon OH , Sunkyu HWANG , Injun HWANG
- 申请人: Samsung Electronics Co., Ltd.
- 申请人地址: KR Suwon-si
- 专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人地址: KR Suwon-si
- 优先权: KR 20220051029 2022.04.25
- 主分类号: H01L29/15
- IPC分类号: H01L29/15 ; H01L29/20 ; H01L29/207 ; H01L29/778
摘要:
Provided are a nitride semiconductor buffer structure and a semiconductor device including the same. The buffer structure may include a plurality of buffer layers between a substrate and an active layer. The active layer may include a nitride semiconductor. The plurality of buffer layers may be stacked on each other on the substrate. Each of the plurality of buffer layers may have a super lattice structure and may include a doped nitride semiconductor. The plurality of buffer layers may have different compositions from each other. Adjacent buffer layers, among the plurality of buffer layers, may have different doping concentrations from each other.
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