Invention Application
- Patent Title: APPARATUS FOR SUBSTRATE DICING AND METHOD THEROF
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Application No.: US17740494Application Date: 2022-05-10
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Publication No.: US20230102791A1Publication Date: 2023-03-30
- Inventor: Sung Ho JANG , Min Hwan SEO , Jang Hwi LEE , Young Chul KWON , Sang Woo BAE , Akinori OKUBO , Jung Chul LEE , Won Don JOO
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Suwon-si
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si
- Priority: KR10-2021-0128921 20210929
- Main IPC: B23K26/53
- IPC: B23K26/53 ; B23K26/38 ; B23K26/03

Abstract:
A method for dicing a substrate includes setting a target height for forming a first reforming region inside a target substrate, the target height being a distance from an upper surface of the target substrate to the first reforming region; irradiating a laser beam to a first sample substrate including a first film and a second film being in contact with the first film, and setting a target condition on the basis of a sample condition that results in forming a condensing point of the laser beam on an upper surface of the first film being in contact with the second film; and irradiating the target substrate with the laser beam according to the target condition to form the first reforming region inside the target substrate, wherein a thickness of the second film is the target height.
Information query
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