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公开(公告)号:US20250079305A1
公开(公告)日:2025-03-06
申请号:US18648097
申请日:2024-04-26
Applicant: Samsung Electronics Co., Ltd.
Inventor: Jun Soo KIM , Sung Ho JANG
IPC: H01L23/528 , H10B41/30 , H10B43/30
Abstract: A capacitor-less semiconductor memory device and a method for fabricating the same are provided. The semiconductor memory device includes a first metal-oxide semiconductor film, a second metal-oxide semiconductor film spaced apart from the first metal-oxide semiconductor film, a first gate electrode intersecting the first metal-oxide semiconductor film and the second metal-oxide semiconductor film, a first gate dielectric film interposed between the first metal-oxide semiconductor film and the first gate electrode, a charge storage film in the first gate dielectric film, the charge storage film extending along at least a portion of the first metal-oxide semiconductor film and connected to the second metal-oxide semiconductor film, a second gate electrode spaced apart from the first gate electrode and intersecting the second metal-oxide semiconductor film, and a second gate dielectric film interposed between the second metal-oxide semiconductor film and the second gate electrode.
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公开(公告)号:US20240234177A1
公开(公告)日:2024-07-11
申请号:US18495224
申请日:2023-10-26
Applicant: Samsung Electronics Co., Ltd.
Inventor: Hun Yong PARK , Yeon Tae KIM , Jang Hwi LEE , Sang Woo BAE , Kyung Su KIM , Tae Soon PARK , Jung Chul LEE , Sung Ho JANG , Won Don JOO
IPC: H01L21/67 , C23C16/44 , C23C16/452 , H01L21/02
CPC classification number: H01L21/67115 , C23C16/4412 , C23C16/452 , H01L21/0228
Abstract: A wafer processing apparatus may include a chamber providing an internal space; and a first rib on an outer side of a first sidewall of the chamber. An outer side of the first rib may include a first portion and a second portion. A light transmittance of the first portion may be different from a light transmittance of the second portion.
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公开(公告)号:US20170213710A1
公开(公告)日:2017-07-27
申请号:US15260910
申请日:2016-09-09
Applicant: Samsung Electronics Co., Ltd.
Inventor: Protopopov VLADIMIR , Ki Ho HWANG , Doug Yong SUNG , Se Jin OH , Kul INN , Sung Ho JANG , Yun Kwang JEON
CPC classification number: H01J37/32935 , H01J37/32715 , H01J37/32972 , H04N5/2252
Abstract: An apparatus for monitoring an interior of a process chamber including a process chamber including a chamber body and a view port defined in the chamber body, a cover section including a pinhole in one end, the cover section disposed to correspond to an end portion of the view port, the cover section having a first length in a direction toward a center point of the process chamber, and a sensing unit inserted into the view port to monitor the interior of the process chamber through the pinhole, a region in the process chamber to be sensed by the sensing unit determined based on the first length may be provided.
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公开(公告)号:US20230102791A1
公开(公告)日:2023-03-30
申请号:US17740494
申请日:2022-05-10
Applicant: Samsung Electronics Co., Ltd.
Inventor: Sung Ho JANG , Min Hwan SEO , Jang Hwi LEE , Young Chul KWON , Sang Woo BAE , Akinori OKUBO , Jung Chul LEE , Won Don JOO
Abstract: A method for dicing a substrate includes setting a target height for forming a first reforming region inside a target substrate, the target height being a distance from an upper surface of the target substrate to the first reforming region; irradiating a laser beam to a first sample substrate including a first film and a second film being in contact with the first film, and setting a target condition on the basis of a sample condition that results in forming a condensing point of the laser beam on an upper surface of the first film being in contact with the second film; and irradiating the target substrate with the laser beam according to the target condition to form the first reforming region inside the target substrate, wherein a thickness of the second film is the target height.
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公开(公告)号:US20230000343A1
公开(公告)日:2023-01-05
申请号:US17586189
申请日:2022-01-27
Applicant: Samsung Electronics Co., Ltd.
Inventor: Jin Yong KIM , Dae Hoon HAN , Wook Rae KIM , Myung Jun LEE , Gwang Sik PARK , Sung Ho JANG
Abstract: An optical measurement apparatus includes a light source unit generating and outputting light, a polarized light generating unit generating polarized light from the light, an optical system generating a pupil image of a measurement target, using the polarized light, a self-interference generating unit generating multiple beams that are split from the pupil image, and a detecting unit detecting a self-interference image generated by interference of the multiple beams with each other.
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6.
公开(公告)号:US20240304427A1
公开(公告)日:2024-09-12
申请号:US18538419
申请日:2023-12-13
Applicant: Samsung Electronics Co., Ltd.
Inventor: Sang Ki NAM , Tae-Hyun KIM , Sung Ho JANG , Seul Gi LEE
CPC classification number: H01J37/32834 , H01J37/32449 , H01J37/32642 , H01L21/67069 , H01J2237/3341
Abstract: The present disclosure relates to an internal pressure control apparatus capable of uniformly processing an upper surface of a semiconductor substrate and a substrate processing apparatus including the same. The substrate processing apparatus comprising a chamber housing including an exhaust hole for exhausting a process gas flowing thereinto, a substrate support unit inside the chamber housing, supporting a semiconductor substrate, a process gas supply unit providing the process gas to the inside of the chamber housing, a plasma generating unit generating plasma inside the chamber housing by using the process gas, and a ring body installed around the substrate support unit and provided as one body, and further comprising an internal pressure control apparatus controlling an internal pressure of the chamber housing, wherein the internal pressure control apparatus controls a posture of the ring body to control an exhaust amount of the process gas flowing into the chamber housing.
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7.
公开(公告)号:US20230028347A1
公开(公告)日:2023-01-26
申请号:US17684052
申请日:2022-03-01
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Jang Ryul PARK , Soon Yang KWON , Kwang Rak KIM , Myung Jun LEE , Sung Ho JANG
Abstract: A method for fabricating a semiconductor device is provided. The method includes: loading a substrate on a stage of an apparatus for inspecting the substrate; extracting a first light having a first wavelength from a light by using a light source; acquiring first position information on at least one focal point, formed on the substrate, based on the first wavelength by using a controller, the at least one focal point being a pre-calculated at least one focal point; adjusting a position of at least one from among an objective lens and at least one microsphere in a vertical direction by using the first position information in the controller; condensing the first light, which has passed through the at least one microsphere, on the at least one focal point formed on the substrate; and inspecting the substrate by using the first light condensed on the at least one focal point.
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公开(公告)号:US20130141720A1
公开(公告)日:2013-06-06
申请号:US13690177
申请日:2012-11-30
Applicant: Samsung Electronics Co., Ltd.
Inventor: Ho Yong PARK , Valdimir VOLYNETS , Vladimir PROTOPOPOV , Sang Heon LEE , Sung Ho JANG , Sang Jean JEON
IPC: G01J3/443
Abstract: A plasma diagnostic apparatus includes a vacuum chamber unit having at least one electrode and having plasma generated inside. A bias power unit is disposed inside the vacuum chamber unit to apply a radio frequency voltage to an electrode that supports a wafer. A spectrum unit decomposes light emitted from inside the plasma according to wavelengths. A light detection unit detects the light decomposed according to wavelengths. A control unit controls a turn-on and turn-off process of the light detection unit according to a waveform of the radio frequency voltage.
Abstract translation: 等离子体诊断装置包括具有至少一个电极并且内部产生等离子体的真空室单元。 偏置功率单元设置在真空室单元内,以对支撑晶片的电极施加射频电压。 光谱单元根据波长分解从等离子体内部发射的光。 光检测单元检测根据波长分解的光。 控制单元根据射频电压的波形来控制光检测单元的接通和关断处理。
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9.
公开(公告)号:US20230184535A1
公开(公告)日:2023-06-15
申请号:US17969200
申请日:2022-10-19
Applicant: Samsung Electronics Co., Ltd.
Inventor: Seung Woo LEE , Wook Rae KIM , Kwang Soo KIM , Myung Jun LEE , Seo Yeon JEONG , Sung Ho JANG
IPC: G01B9/02055 , G01B9/02015 , G01B9/02 , G01B9/02001
CPC classification number: G01B9/02063 , G01B9/0203 , G01B9/02083 , G01B9/02011 , H01L22/12
Abstract: A optical measurement apparatus includes: an optical system which generates a pupil image of a measurement target, using light; a polarization generator which generates a polarized light from the light; a self-interference generator which generates a plurality of beams divided from the pupil image, using the polarized light, and causes the plurality of beams to interfere with each other to generate a self-interference image; and an image analysis unit configured to extract phase data from the self-interference image, and to move the measurement target to a focus position on the basis of the phase data.
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公开(公告)号:US20190164731A1
公开(公告)日:2019-05-30
申请号:US16262024
申请日:2019-01-30
Applicant: Samsung Electronics Co., Ltd.
Inventor: Protopopov VLADIMIR , Ki Ho HWANG , Doug Yong SUNG , Se Jin OH , Kul INN , Sung Ho JANG , Yun Kwang JEON
Abstract: An apparatus for monitoring an interior of a process chamber including a process chamber including a chamber body and a view port defined in the chamber body, a cover section including a pinhole in one end, the cover section disposed to correspond to an end portion of the view port, the cover section having a first length in a direction toward a center point of the process chamber, and a sensing unit inserted into the view port to monitor the interior of the process chamber through the pinhole, a region in the process chamber to be sensed by the sensing unit determined based on the first length may be provided.
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