Invention Publication
- Patent Title: GATE-ALL-AROUND TRANSISTOR CIRCUIT MODIFICATION USING DIRECT CONTACT AND/OR ACCESS PROBE POINTS
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Application No.: US17856777Application Date: 2022-07-01
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Publication No.: US20240006302A1Publication Date: 2024-01-04
- Inventor: Richard H. Livengood , Muhammad Usman Raza , Waqas Ali , Tahir Malik , Shida Tan , Martin Von Haartman , Mauro Kobrinsky , Amir Raveh , Clifford J. Engle
- Applicant: Intel Corporation
- Applicant Address: US CA Santa Clara
- Assignee: Intel Corporation
- Current Assignee: Intel Corporation
- Current Assignee Address: US CA Santa Clara
- Main IPC: H01L23/50
- IPC: H01L23/50 ; H01L23/528 ; H01L29/06 ; H01L29/08 ; H01L29/423 ; H01L29/786

Abstract:
Techniques and structures are disclosed related to coupling to gate-all-around transistors for test and/or debug of an integrated circuit. The gate-all-around transistors, which may also be referred to as 3D stacked transistors or ribbon-FET transistors are contacted directly from the back side or they are contacted using a dedicated probe point on the back side of the gate-all-around transistors. Such contact may be made to probe the devices and/or to provide edit wires to modify the integrated circuit.
Information query
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