Invention Publication
- Patent Title: POLISHING COMPOSITION
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Application No.: US18529763Application Date: 2023-12-05
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Publication No.: US20240110080A1Publication Date: 2024-04-04
- Inventor: Yuichiro NAKAGAI , Yasuaki ITO , Hiroyuki ODA , Shogaku IDE , Shinichiro TAKAMI
- Applicant: FUJIMI INCORPORATED
- Applicant Address: JP Aichi
- Assignee: FUJIMI INCORPORATED
- Current Assignee: FUJIMI INCORPORATED
- Current Assignee Address: JP Aichi
- Priority: JP 21016870 2021.02.04
- Main IPC: C09G1/02
- IPC: C09G1/02

Abstract:
Provided is a polishing composition containing an abrasive, permanganate, an aluminum salt, and water. In the polishing composition, a relation of a content W1 [% by weight] of the abrasive, a concentration C1 [mM] of the permanganate, and a concentration C2 [mM] of the aluminum salt satisfies at least one condition of the following conditions [A], [B], and [C]:
satisfying both of 500≤(C1/W1) and 0.04≤(C2/C1); [A]
satisfying both of 200≤(C1/√(W1)) and 8≤C2; and [B]
satisfying both of 500≤(C1/W1) and 8≤C2. [C]
satisfying both of 500≤(C1/W1) and 0.04≤(C2/C1); [A]
satisfying both of 200≤(C1/√(W1)) and 8≤C2; and [B]
satisfying both of 500≤(C1/W1) and 8≤C2. [C]
Public/Granted literature
- US12139643B2 Polishing composition Public/Granted day:2024-11-12
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