Invention Publication
- Patent Title: COPPER FILL FOR HEAT MANAGEMENT IN INTEGRATED CIRCUIT DEVICE
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Application No.: US17972923Application Date: 2022-10-24
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Publication No.: US20240136243A1Publication Date: 2024-04-25
- Inventor: Min Suet Lim , Telesphor Kamgaing , Ilan Ronen , Kavitha Nagarajan , Chee Kheong Yoon , Chu Aun Lim , Eng Huat Goh , Jooi Wah Wong
- Applicant: Intel Corporation
- Applicant Address: US CA Santa Clara
- Assignee: Intel Corporation
- Current Assignee: Intel Corporation
- Current Assignee Address: US CA Santa Clara
- Main IPC: H01L23/367
- IPC: H01L23/367 ; H01L23/42 ; H01L23/532

Abstract:
Described herein are integrated circuit devices that include semiconductor devices near the center of the device, rather than towards the top or bottom of the device. In this arrangement, heat can become trapped inside the device. Metal fill, such as copper, is formed within a portion of the device, e.g., over the semiconductor devices and any front side interconnect structures, to transfer heat away from the semiconductor devices and towards a heat spreader.
Public/Granted literature
- US20240234234A9 COPPER FILL FOR HEAT MANAGEMENT IN INTEGRATED CIRCUIT DEVICE Public/Granted day:2024-07-11
Information query
IPC分类: