Invention Publication
- Patent Title: POLYMER, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS
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Application No.: US17985439Application Date: 2022-11-11
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Publication No.: US20240184201A1Publication Date: 2024-06-06
- Inventor: Conner A. Hoelzel , Li Cui , Jong Keun Park , Emad Aqad , James F. Cameron
- Applicant: Rohm and Haas Electronic Materials LLC
- Applicant Address: US MA Marlborough
- Assignee: Rohm and Haas Electronic Materials LLC
- Current Assignee: Rohm and Haas Electronic Materials LLC
- Current Assignee Address: US MA Marlborough
- Main IPC: G03F7/039
- IPC: G03F7/039 ; C08F212/14 ; C08F220/18 ; G03F7/038

Abstract:
A polymer including a first repeating unit derived from a first monomer represented by formula (1); and a second repeating unit comprising an acid labile group, a hydroxyaryl group, a sulfonamide group, a fluoroalcohol group, or a combination thereof,
wherein, in formula (1), P is a polymerizable group comprising an ethylenically unsaturated carbon-carbon double bond; L1 is a single bond or a linking group; Ar is a substituted or unsubstituted C6-30 aromatic group or a substituted or unsubstituted C4-30 heteroaromatic group; X is O or S; A is a group selected from —O—, —S—, —S(O)—, —S(O)2—, —C(O)—, —C(S)—, or —N(Ra)—; Ra is hydrogen or a non-hydrogen substituent; and R1 and R2 are each as defined herein, wherein the first repeating unit and the second repeating unit are structurally different.
wherein, in formula (1), P is a polymerizable group comprising an ethylenically unsaturated carbon-carbon double bond; L1 is a single bond or a linking group; Ar is a substituted or unsubstituted C6-30 aromatic group or a substituted or unsubstituted C4-30 heteroaromatic group; X is O or S; A is a group selected from —O—, —S—, —S(O)—, —S(O)2—, —C(O)—, —C(S)—, or —N(Ra)—; Ra is hydrogen or a non-hydrogen substituent; and R1 and R2 are each as defined herein, wherein the first repeating unit and the second repeating unit are structurally different.
Information query
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