发明授权
- 专利标题: Systems and methods for ion source control in ion implanters
- 专利标题(中): 离子注入机离子源控制的系统和方法
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申请号: US774110申请日: 1985-09-09
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公开(公告)号: US4754200A公开(公告)日: 1988-06-28
- 发明人: Frederick Plumb , Christopher Wright , Nicholas J. Bright , Derek Aitken , Bernard Harrison
- 申请人: Frederick Plumb , Christopher Wright , Nicholas J. Bright , Derek Aitken , Bernard Harrison
- 申请人地址: CA Santa Clara
- 专利权人: Applied Materials, Inc.
- 当前专利权人: Applied Materials, Inc.
- 当前专利权人地址: CA Santa Clara
- 主分类号: H01L21/265
- IPC分类号: H01L21/265 ; H01J27/02 ; H01J27/14 ; H01J37/08 ; H01J37/24 ; H01J37/248 ; H01J37/317 ; H01J7/24 ; H05B31/26
摘要:
A method for operating an ion source having a filament-cathode and an anode. The method includes supplying direct current electrical power between the anode and the filament-cathode characterized by substantially constant arc current there between and varying arc voltage on the filament-cathode. Direct current electrical power is also supplied across the filament-cathode. The value of the arc voltage is monitored and the magnitude of electrical power supplied to the filament-cathode is altered in response to detected changes in the arc voltage to return the arc voltage to substantially a preset reference value. The monitoring step and the altering step are carried out at regular preset intervals. The altering step includes deriving an filament power error signal as a prearranged function which includes the difference in values between the monitored arc voltage and the preset reference value multiplied by a predefined integral gain value. The altering step also includes altering the magnitude of electrical power supplied to the filament-cathode by the value of the filament power error signal.
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