发明授权
US4770977A Silicon-containing polymer and its use as a masking resin in a
lithography process
失效
含硅聚合物及其在光刻工艺中作为掩蔽树脂的用途
- 专利标题： Silicon-containing polymer and its use as a masking resin in a lithography process
- 专利标题（中）： 含硅聚合物及其在光刻工艺中作为掩蔽树脂的用途
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申请号： US46913申请日： 1987-05-07
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公开(公告)号： US4770977A公开(公告)日： 1988-09-13
- 发明人: Francois Buiguez , Louis Giral , Charles Rosilio , Francois Schue
- 申请人： Francois Buiguez , Louis Giral , Charles Rosilio , Francois Schue
- 申请人地址： FRX Paris
- 专利权人： Commissariat a l'Energie Atomique
- 当前专利权人： Commissariat a l'Energie Atomique
- 当前专利权人地址： FRX Paris
- 主分类号： C08F30/08
- IPC分类号： C08F30/08 ; G03F7/075 ; G03C5/16
摘要：
Photosensitive film which is photosensitive in a given wavelength range comprises at least one silicon-containing polymer, at least one salt which can be converted into a Brunsted acid by irradiation and optionally at least one photosensitizer. The silicon-containing polymer-based photosensitive film can be used as a masking resin in a lithography process for producing electronic components.
公开/授权文献
- USD401062S Pistol case 公开/授权日：1998-11-17
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