发明授权
- 专利标题: Halogenated carboxylic acid cleaning agents for fabricating integrated circuits and a process for using the same
- 专利标题(中): 用于制造集成电路的羟基羧酸清洁剂及其使用方法
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申请号: US777821申请日: 1991-10-11
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公开(公告)号: US5213621A公开(公告)日: 1993-05-25
- 发明人: John C. Ivankovits , David A. Bohling , David A. Roberts
- 申请人: John C. Ivankovits , David A. Bohling , David A. Roberts
- 申请人地址: PA Allentown
- 专利权人: Air Products and Chemicals, Inc.
- 当前专利权人: Air Products and Chemicals, Inc.
- 当前专利权人地址: PA Allentown
- 主分类号: C11D7/02
- IPC分类号: C11D7/02 ; C11D7/08 ; C11D7/28 ; C11D11/00 ; C23G5/00 ; H01L21/304 ; H01L21/306 ; H01L21/3105 ; H05K3/26
摘要:
This invention is a vapor-phase process for cleaning metal-containing contaminants from the surfaces of integrated circuits and semiconductors between the numerous fabricating steps required to manufacture the finished electronic devices. The process employs cleaning agents comprising an effective amount of a partially halogenated or fully halogenated linear or branched carboxylic acid having from 2 to about 10 carbon atoms wherein the halogen is selected from fluorine or chlorine. The process comprises contacting the surface to be cleaned with an effective amount of the desired cleaning agent at a temperature sufficient to form volatile metal-ligand complexes on the surface of the substrate to be cleaned. The volatile metal-ligand complexes are sublimed from the surfaces of the substrate providing a clean, substantially residue-free surface.
公开/授权文献
- US5882770A Rainbow and hologram images on fabrics 公开/授权日:1999-03-16