发明授权
US5300348A Frame-supported pellicle for photolithography, comprising a fluorocarbon
containing organopolysiloxane based adhesive
失效
用于光刻的框架支撑防护薄膜组件，包括含有氟聚合物的基于有机聚硅氧烷的粘合剂
- 专利标题： Frame-supported pellicle for photolithography, comprising a fluorocarbon containing organopolysiloxane based adhesive
- 专利标题（中）： 用于光刻的框架支撑防护薄膜组件，包括含有氟聚合物的基于有机聚硅氧烷的粘合剂
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申请号： US959032申请日： 1992-10-08
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公开(公告)号： US5300348A公开(公告)日： 1994-04-05
- 发明人: Yoshihiro Kubota , Meguru Kashida , Yoshihiko Nagata , Hitoshi Noguchi , Yuichi Hamada , Shinichi Sato , Hiroshi Inomata
- 申请人： Yoshihiro Kubota , Meguru Kashida , Yoshihiko Nagata , Hitoshi Noguchi , Yuichi Hamada , Shinichi Sato , Hiroshi Inomata
- 申请人地址： JPX Tokyo
- 专利权人： Shin-Etsu Chemical Co., Ltd.
- 当前专利权人： Shin-Etsu Chemical Co., Ltd.
- 当前专利权人地址： JPX Tokyo
- 优先权： JPX3-295124 19911015
- 主分类号： C09J183/14
- IPC分类号： C09J183/14 ; C08G77/48 ; C08G77/50 ; C08J5/12 ; C08L83/02 ; C08L83/04 ; C08L83/05 ; C08L83/14 ; C09J183/00 ; G03F1/62 ; G03F7/075 ; H01L21/027 ; H01L21/30 ; B32B9/60
摘要：
An improvement is proposed in a frame-supported pellicle consisting of a frame member and a thin transparent polymer membrane adhesively bonded to the frame member used for dustproof covering of a photomask in a photolithograpic patterning work of electronic devices. The improvement comprises using a specific fluorocarbon group-containing organosiloxane-based polymeric composition as an adhesive for adhesively bonding the frame member and the polymer membrane. This adhesive is effective even when the polymeric membrane is formed from a fluorocarbon polymer which is hardly susceptible to adhesive bonding with conventional adhesives. In addition, the adhesive bonding by use of this specific adhesive is highly durable even under irradiation with ultraviolet light.
公开/授权文献
- US5900347A Optical information recording medium 公开/授权日：1999-05-04
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