Invention Grant
- Patent Title: Non-volatile DRAM cell
- Patent Title (中): 非易失性DRAM单元
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Application No.: US841343Application Date: 1992-02-25
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Publication No.: US5331188APublication Date: 1994-07-19
- Inventor: Alexandre Acovic , Ching-Hsiang Hsu , Matthew R. Wordeman , Being S. Wu
- Applicant: Alexandre Acovic , Ching-Hsiang Hsu , Matthew R. Wordeman , Being S. Wu
- Applicant Address: NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: NY Armonk
- Main IPC: H01L27/105
- IPC: H01L27/105 ; G11B17/028 ; G11C14/00 ; H01L21/8247 ; H01L29/788 ; H01L29/792 ; H01L29/68 ; G11C11/24
Abstract:
The present invention is directed to a one-transistor non-volatile DRAM cell having a two layer floating gate to allow the contents of a storage capacitor to be transferred to the floating gate during power interruptions. The first layer of the floating gate is separated from a storage node of the storage capacitor by a tunnel oxide to allow electron tunnelling between the floating gate and the storage capacitor. In another embodiment of the present invention, a dual electron injector structure is disposed between a one layer floating and the storage node to allow electrons to be injected between the floating gate and the storage node. In another embodiment of the present invention, an erase gate is implemented to remove the charge on the floating gate. The erase gate can be separated from the floating gate by a tunnel oxide or a single electron injector structure to allow electrons to travel from the floating gate to the erase gate.
Public/Granted literature
- US4120052A Cushioned protector Public/Granted day:1978-10-17
Information query
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