发明授权
- 专利标题： Surface processing apparatus
- 专利标题（中）： 表面处理装置
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申请号： US973915申请日： 1992-11-12
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公开(公告)号： US5332442A公开(公告)日： 1994-07-26
- 发明人: Masao Kubodera , Masaki Narushima , Masahito Ozawa , Hiromi Kumagai , Tomihiro Yonenaga , Sumi Tanaka
- 申请人： Masao Kubodera , Masaki Narushima , Masahito Ozawa , Hiromi Kumagai , Tomihiro Yonenaga , Sumi Tanaka
- 申请人地址： JPX
- 专利权人： Tokyo Electron Kabushiki Kaisha
- 当前专利权人： Tokyo Electron Kabushiki Kaisha
- 当前专利权人地址： JPX
- 优先权： JPX3-326676 19911115; JPX3-339912 19911128
- 主分类号： C23C16/44
- IPC分类号： C23C16/44 ; C23C16/455 ; C23C16/458 ; C23C16/48 ; C30B25/10 ; C30B31/20 ; H01L21/00 ; C23C16/00
摘要：
The present invention relates to a surface processing apparatus which performs heating processing of an object of heating which is mounted on a mounting device provided inside a process container, and which includes a plural number of lamps provided so as to oppose a rear surface of a processing surface of an object of processing, a rotating unit which has the plural number of lamps mounted to it in a ring shape, and a drive unit which drives the rotating unit. Also, the present invention relates to a processing apparatus for leading a process gas from a gas supply tube to a gas chamber partitioned inside a process container, and which blows process gas from an outlet of the gas chamber and onto an object of processing which is mounted on a mounting device provided inside the process container, and which includes a plural number of partition plates each provided with a plural number of through holes, being provided at required intervals in a direction of gas flow and inside the gas chamber.
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