发明授权
- 专利标题: Batch erasable nonvolatile memory device and erasing method
- 专利标题(中): 批量可擦除非易失性存储器件和擦除方法
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申请号: US445105申请日: 1995-05-19
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公开(公告)号: US5598368A公开(公告)日: 1997-01-28
- 发明人: Masahito Takahashi , Michiko Odagiri , Takeshi Furuno , Kazunori Furusawa , Masashi Wada
- 申请人: Masahito Takahashi , Michiko Odagiri , Takeshi Furuno , Kazunori Furusawa , Masashi Wada
- 申请人地址: JPX Tokyo JPX Tokyo JPX Saitama
- 专利权人: Hitachi, Ltd.,Hitachi ULSI Engineering Corp.,Hitachi Tohbu Semiconductor, Ltd.
- 当前专利权人: Hitachi, Ltd.,Hitachi ULSI Engineering Corp.,Hitachi Tohbu Semiconductor, Ltd.
- 当前专利权人地址: JPX Tokyo JPX Tokyo JPX Saitama
- 优先权: JPX6-129691 19940519
- 主分类号: G11C17/00
- IPC分类号: G11C17/00 ; G11C16/02 ; G11C16/16 ; G11C16/34 ; G11C13/00
摘要:
A batch erasable nonvolatile memory device and an apparatus using the same provided with memory cells which are adapted to execute an erase operation by a ejecting an electric charge accumulated at floating gates by program operation (including a pre-write operation), carries out, in sequence, a first operation for reading memory cells of an erase unit and carrying out a pre-write operation on those nonvolatile memory cells at the floating gates of which electric charge is not stored, a second operation for carrying out a batch erase operation at a high speed for the nonvolatile memory cells of said erase unit with a relatively large energy under a relatively large erase reference voltage, a third operation for carrying out a read operation of said all erased nonvolatile memory cells and a write operation on those nonvolatile memory cells which are adapted to have a relatively low threshold voltage, and a fourth operation for carrying out a batch erase operation at a low speed for the nonvolatile memory cells of said erase unit with a relatively small energy under a relatively small erase reference voltage, or is provided with an automatic erasing circuit for executing these operations.
公开/授权文献
- US5049209A Magnetic nitride film 公开/授权日:1991-09-17
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