发明授权
- 专利标题： Method and apparatus for fabricating superconductor device
- 专利标题（中）： 制造超导体器件的方法和装置
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申请号： US254707申请日： 1994-06-06
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公开(公告)号： US5602079A公开(公告)日： 1997-02-11
- 发明人: Tsuyoshi Takenaka , Katsumi Suzuki , Shuichi Fujino , Youichi Enomoto
- 申请人： Tsuyoshi Takenaka , Katsumi Suzuki , Shuichi Fujino , Youichi Enomoto
- 申请人地址： JPX Tokyo JPX Hyogo-ken JPX Tokyo JPX Tokyo
- 专利权人： International Superconductivity Technology Center,Kawasaki Jukogyo Kabushiki Kaisha,NEC Corporation,Mitsubishi Materials Corporation
- 当前专利权人： International Superconductivity Technology Center,Kawasaki Jukogyo Kabushiki Kaisha,NEC Corporation,Mitsubishi Materials Corporation
- 当前专利权人地址： JPX Tokyo JPX Hyogo-ken JPX Tokyo JPX Tokyo
- 优先权： JPX5-138709 19930610
- 主分类号： B23K26/00
- IPC分类号： B23K26/00 ; B23K26/12 ; B23K26/40 ; B23K26/42 ; C23F4/04 ; H01L39/06 ; H01L39/24
摘要：
A superconducting device having a superconducting film measures a characteristic such as its resonance frequency while in an environment having a temperature that is less than or equal to its superconducting transition temperature. A laser then thermally etches the superconducting film on the basis of said measurement in the environment having a temperature that is less than or equal to a superconducting transition temperature.
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