发明授权
- 专利标题： Polishing method and polishing apparatus
- 专利标题（中）： 抛光方法和抛光装置
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申请号： US743044申请日： 1996-11-04
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公开(公告)号： US5775980A公开(公告)日： 1998-07-07
- 发明人: Yasutaka Sasaki , Mie Matsuo , Rempei Nakata , Junichi Wada , Nobuo Hayasaka , Hiroyuki Yano , Haruo Okano
- 申请人： Yasutaka Sasaki , Mie Matsuo , Rempei Nakata , Junichi Wada , Nobuo Hayasaka , Hiroyuki Yano , Haruo Okano
- 申请人地址： JPX Kawasaki
- 专利权人： Kabushiki Kaisha Toshiba
- 当前专利权人： Kabushiki Kaisha Toshiba
- 当前专利权人地址： JPX Kawasaki
- 优先权： JPX5-068906 19930326; JPX5-231283 19930917; JPX5-231284 19930917; JPX5-286988 19931116; JPX6-044160 19940315; JPX6-044316 19940315
- 主分类号： B24B37/015
- IPC分类号： B24B37/015 ; B24B49/14 ; B24B57/02 ; H01L21/02 ; H01L21/321 ; H01L21/3213 ; H01L21/768 ; B24B5/00
摘要：
This invention provides a polishing method including the steps of forming a film to be polished on a substrate having a recessed portion in its surface so as to fill at least the recessed portion, and selectively leaving the film to be polished behind in the recessed portion by polishing the film by using a polishing agent containing polishing particles and a solvent, and having a pH of 7.5 or more. The invention also provides a polishing apparatus including a polishing agent storage vessel for storing a polishing agent, a turntable for polishing an object to be polished, a polishing agent supply pipe for supplying the polishing agent from the polishing agent storage vessel onto the turntable, a polishing object holding jig for holding the object to be polished such that the surface to be polished of the object opposes the turntable, and a polishing agent supply pipe temperature adjusting unit, connected to the polishing agent supply pipe, for adjusting the temperature of the polishing agent.
公开/授权文献
- US4610312A Redundant firing mechanism for a well perforating gun 公开/授权日：1986-09-09
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