发明授权
US5923063A Double density V nonvolatile memory cell 失效
双密度V非易失性存储单元

Double density V nonvolatile memory cell
摘要:
Floating gates of nonvolatile memory cells are formed in pairs within a pyramidal or truncated pyramidal opening in a semiconductor layer between a top surface thereof and a heavily doped source region spaced from the surface of the semiconductor layer. The floating gates control the conductance of channel regions formed along the sloped sidewalls of the pyramidal openings between surface drains and the buried source region.
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