发明授权
- 专利标题: Double density V nonvolatile memory cell
- 专利标题(中): 双密度V非易失性存储单元
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申请号: US26358申请日: 1998-02-19
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公开(公告)号: US5923063A公开(公告)日: 1999-07-13
- 发明人: Yowjuang W. Liu , Donald L. Wollesen , John T. Yue
- 申请人: Yowjuang W. Liu , Donald L. Wollesen , John T. Yue
- 申请人地址: CA Sunnyvale
- 专利权人: Advanced Micro Devices, Inc.
- 当前专利权人: Advanced Micro Devices, Inc.
- 当前专利权人地址: CA Sunnyvale
- 主分类号: H01L21/8247
- IPC分类号: H01L21/8247 ; H01L27/115 ; H01L29/423 ; H01L29/788 ; H01L29/76 ; H01L29/792 ; H01L29/88
摘要:
Floating gates of nonvolatile memory cells are formed in pairs within a pyramidal or truncated pyramidal opening in a semiconductor layer between a top surface thereof and a heavily doped source region spaced from the surface of the semiconductor layer. The floating gates control the conductance of channel regions formed along the sloped sidewalls of the pyramidal openings between surface drains and the buried source region.
公开/授权文献
- USD358315S Reciprocating saw 公开/授权日:1995-05-16
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