Method for evaluating the effect of a barrier layer on electromigration
for plug and non-plug interconnect systems
    4.
    发明授权
    Method for evaluating the effect of a barrier layer on electromigration for plug and non-plug interconnect systems 失效
    用于评估阻塞层对插塞和非插头互连系统的电迁移的影响的方法

    公开(公告)号:US5786705A

    公开(公告)日:1998-07-28

    申请号:US747803

    申请日:1996-11-14

    IPC分类号: G01R27/26 G01R31/28

    CPC分类号: G01R31/2853 G01R31/2858

    摘要: A substantially constant current is conducted in a first direction through an interconnect structure having a barrier layer to determine the lifetime of the structure in the first current direction. A substantially identical current is conducted in a second direction through a substantially identical interconnect structure to determine the lifetime of the structure in the second current direction. These tests are repeated for identical structures but having different barrier layer thicknesses. The results of these lifetime tests are compared to determine the barrier layer's effect on electromigration in the structure, which can be used to design the barrier layer to optimize the structure's lifetime and speed.

    摘要翻译: 通过具有阻挡层的互连结构在第一方向上进行基本恒定的电流,以确定结构在第一电流方向上的寿命。 通过基本相同的互连结构在第二方向上进行基本上相同的电流,以确定结构在第二电流方向上的寿命。 对相同的结构重复这些测试,但具有不同的阻挡层厚度。 比较这些寿命测试的结果以确定阻挡层对结构中电迁移的影响,可用于设计阻挡层以优化结构的寿命和速度。

    Apparatus and method for testing image sensor wafers to identify pixel defects
    5.
    发明授权
    Apparatus and method for testing image sensor wafers to identify pixel defects 有权
    用于测试图像传感器晶片以识别像素缺陷的装置和方法

    公开(公告)号:US08000520B2

    公开(公告)日:2011-08-16

    申请号:US11946265

    申请日:2007-11-28

    CPC分类号: H04N17/002 H04N5/367

    摘要: An image sensor testing apparatus is disclosed. The image sensor testing apparatus includes an electronic test system having a light source for illuminating an image sensor wafer to generate pixel data and a host processor for receiving the pixel data. An interface card coupled to the electronic test system has a programmable processor for processing the pixel data to generate processed data, the processed data transmitted to and analyzed by the host processor together with the pixel data to detect pixel defects in the image sensor wafer.

    摘要翻译: 公开了一种图像传感器测试装置。 图像传感器测试装置包括具有用于照射图像传感器晶片以产生像素数据的光源的电子测试系统和用于接收像素数据的主机处理器。 耦合到电子测试系统的接口卡具有可编程处理器,用于处理像素数据以产生经处理的数据,经处理的数据与主处理器一起发送到并由其分析,以检测图像传感器晶片中的像素缺陷。

    Void detection in metallization patterns
    7.
    发明授权
    Void detection in metallization patterns 失效
    金属化模式中的空隙检测

    公开(公告)号:US5504017A

    公开(公告)日:1996-04-02

    申请号:US359464

    申请日:1994-12-20

    IPC分类号: G01N25/72 H01L21/66 G01N27/20

    CPC分类号: G01N25/72

    摘要: Voids in a metallization pattern comprising a barrier layer, such as those generated by stress migration, are detected by applying a current across a test section of the metallization pattern to generate hot spots which are detected as by employing an infrared microscope or with a liquid crystalline material.

    摘要翻译: 通过在金属化图案的测试部分施加电流以产生热点,通过使用红外显微镜或液晶检测来检测包括阻挡层(例如由应力迁移产生的阻挡层)的金属化图案的空隙 材料。

    Method for evaluating the effect of a barrier layer on electromigration
for plug and non-plug interconnect systems
    8.
    发明授权
    Method for evaluating the effect of a barrier layer on electromigration for plug and non-plug interconnect systems 失效
    用于评估阻塞层对插塞和非插头互连系统的电迁移的影响的方法

    公开(公告)号:US5612627A

    公开(公告)日:1997-03-18

    申请号:US348645

    申请日:1994-12-01

    IPC分类号: G01R27/26 G01R31/28

    CPC分类号: G01R31/2853 G01R31/2858

    摘要: A substantially constant current is conducted in a first direction through an interconnect structure having a barrier layer to determine the lifetime of the structure in the first current direction. A substantially identical current is conducted in a second direction through a substantially identical interconnect structure to determine the lifetime of the structure in the second current direction. These tests are repeated for identical structures but having different barrier layer thicknesses. The results of these lifetime tests are compared to determine the barrier layer's effect on electromigration in the structure, which can be used to design the barrier layer to optimize the structure's lifetime and speed.

    摘要翻译: 通过具有阻挡层的互连结构在第一方向上进行基本恒定的电流,以确定结构在第一电流方向上的寿命。 通过基本相同的互连结构在第二方向上进行基本上相同的电流,以确定结构在第二电流方向上的寿命。 对相同的结构重复这些测试,但具有不同的阻挡层厚度。 比较这些寿命测试的结果以确定阻挡层对结构中电迁移的影响,可用于设计阻挡层以优化结构的寿命和速度。