发明授权
- 专利标题： Abrasive liquid for metal and method for polishing
- 专利标题（中）： 金属研磨液和抛光方法
-
申请号： US09976001申请日： 2001-10-15
-
公开(公告)号： US06899821B2公开(公告)日： 2005-05-31
- 发明人: Takeshi Uchida , Jun Matsuzawa , Tetsuya Hoshino , Yasuo Kamigata , Hiroki Terazaki , Yoshio Honma , Seiichi Kondoh
- 申请人： Takeshi Uchida , Jun Matsuzawa , Tetsuya Hoshino , Yasuo Kamigata , Hiroki Terazaki , Yoshio Honma , Seiichi Kondoh
- 申请人地址： JP Tokyo JP Tokyo
- 专利权人： Hitachi Chemical Company, Ltd.,Hitachi, Ltd.
- 当前专利权人： Hitachi Chemical Company, Ltd.,Hitachi, Ltd.
- 当前专利权人地址： JP Tokyo JP Tokyo
- 代理机构： Antonelli, Terry, Stout & Kraus, LLP
- 优先权： JP10-245616 19980831; JP10-351188 19981210
- 主分类号： C09G1/02
- IPC分类号： C09G1/02 ; C23F3/00 ; C23F3/06 ; H01L21/321 ; C09K13/00 ; C09K13/06 ; H01L21/302
摘要：
An abrasive liquid for a metal comprising (1) an oxidizing agent for a metal, (2) a dissolving agent for an oxidized metal, (3) a first protecting film-forming agent such as an amino acid or an azole which adsorbs physically on the surface of the metal and/or forms a chemical bond, to thereby form a protecting film, (4) a second protecting film-forming agent such as polyacrylic acid, polyamido acid or a salt thereof which assists the first protecting film-forming agent informing a protecting film and (5) water; and a method for polishing.
公开/授权文献
- US20020017630A1 Abrasive liquid for metal and method for polishing 公开/授权日：2002-02-14