发明授权
- 专利标题: Methods for forming a semiconductor thin film
- 专利标题(中): 形成半导体薄膜的方法
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申请号: US10366754申请日: 2003-02-13
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公开(公告)号: US06946367B2公开(公告)日: 2005-09-20
- 发明人: Masakiyo Matsumura , Mikihiko Nishitani , Yoshinobu Kimura , Masayuki Jyumonji , Yukio Taniguchi , Masato Hiramatsu , Fumiki Nakano
- 申请人: Masakiyo Matsumura , Mikihiko Nishitani , Yoshinobu Kimura , Masayuki Jyumonji , Yukio Taniguchi , Masato Hiramatsu , Fumiki Nakano
- 申请人地址: JP Yokohama
- 专利权人: Kabushiki Kaisha Ekisho Sentan Gijutsu Kaihatsu Center
- 当前专利权人: Kabushiki Kaisha Ekisho Sentan Gijutsu Kaihatsu Center
- 当前专利权人地址: JP Yokohama
- 代理机构: Graybeal Jackson Haley LLP
- 优先权: JP2002-053130 20020228
- 主分类号: B23K26/06
- IPC分类号: B23K26/06 ; C30B1/00 ; C30B13/00 ; C30B13/24 ; H01L21/20 ; H01L21/268 ; H01L21/322
摘要:
Methods for forming a single crystal semiconductor thin film layer from a non-single crystal layer includes directing a light source having a homogenized intensity distribution and a modulated amplitude towards the non-single crystal layer, and relatively moving the light with respect to the layer wherein the amplitude of the conditioned light is preferably increased in the direction of relative motion of the light to the layer. Preferred methods also include multiple light exposures in overlapping series to form ribbon-shaped single crystal regions, and providing a low temperature point in the semiconductor layer to generate a starting location for single crystalization.
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