发明授权
- 专利标题: Automatic gas control system for a gas discharge laser
- 专利标题(中): 气体放电激光器自动气体控制系统
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申请号: US10356168申请日: 2003-01-31
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公开(公告)号: US06963595B2公开(公告)日: 2005-11-08
- 发明人: John A. Rule , Richard C. Morton , Vladimir V. Fleurov , Fedor Trintchouk , Toshihiko Ishihara , Alexander I. Ershov , James A. Carmichael
- 申请人: John A. Rule , Richard C. Morton , Vladimir V. Fleurov , Fedor Trintchouk , Toshihiko Ishihara , Alexander I. Ershov , James A. Carmichael
- 申请人地址: US CA San Diego
- 专利权人: Cymer, Inc.
- 当前专利权人: Cymer, Inc.
- 当前专利权人地址: US CA San Diego
- 代理机构: Cymer, Inc.
- 代理商 William C. Cray
- 主分类号: H01L21/027
- IPC分类号: H01L21/027 ; G03F7/20 ; H01S20060101 ; H01S3/036 ; H01S3/041 ; H01S3/08 ; H01S3/134 ; H01S3/22 ; H01S3/223 ; H01S3/225 ; H01S3/23
摘要:
An automatic F2 laser gas control, for a modular high repetition rate ultraviolet gas discharge laser. The laser gas control includes techniques, monitors, and processor for monitoring the F2 consumption rates through the operating life of the laser system. These consumption rates are used by a processor programmed with an algorithm to determine F2 injections needed to maintain laser beam quality within a delivery range. Preferred embodiments include F2 controls for a two-chamber MOPA laser system.
公开/授权文献
- US20040022293A1 Automatic gas control system for a gas discharge laser 公开/授权日:2004-02-05
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