- 专利标题: Raster frame beam system for electron beam lithography
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申请号: US10661719申请日: 2003-09-11
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公开(公告)号: US07098468B2公开(公告)日: 2006-08-29
- 发明人: Meir Aloni , Mula Friedman , Jimmy Vishnipolsky , Gilad Almogy , Alon Litman , Yonatah Lehman , Doron Meshulach , Ehud Tirosh
- 申请人: Meir Aloni , Mula Friedman , Jimmy Vishnipolsky , Gilad Almogy , Alon Litman , Yonatah Lehman , Doron Meshulach , Ehud Tirosh
- 申请人地址: US CA Santa Clara
- 专利权人: Applied Materials, Inc.
- 当前专利权人: Applied Materials, Inc.
- 当前专利权人地址: US CA Santa Clara
- 代理商 Tarek N. Fahmi
- 主分类号: G21K5/10
- IPC分类号: G21K5/10 ; H01J37/08 ; A61N5/00 ; G21G5/00
摘要:
A method for writing a master image on a substrate includes dividing the master image into a matrix of frames, each frame including an array of pixels defining a respective frame image in a respective frame position within the master image. An electron beam is scanned in a raster pattern over the substrate, while shaping the electron beam responsively to the respective frame image of each of the frames as the electron beam is scanned over the respective frame position, so that in each frame, the electron beam simultaneously writes a multiplicity of the pixels onto the substrate.
公开/授权文献
- US20050274911A1 Raster frame beam system for electron beam lithography 公开/授权日:2005-12-15
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