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    Data converter apparatus and method particularly useful for a database-to-object inspection system
    7.
    发明授权
    Data converter apparatus and method particularly useful for a database-to-object inspection system 有权
    数据转换装置和方法对数据库对象检查系统特别有用

    公开(公告)号：US06366687B1

    公开(公告)日：2002-04-02

    申请号：US09029625

    申请日：1998-08-10

    申请人： Meir Aloni ,  Nissim Elmaliach ,  Mula Friedman ,  Yonatan Lehman

    发明人： Meir Aloni ,  Nissim Elmaliach ,  Mula Friedman ,  Yonatan Lehman

    IPC分类号： G06K903

    CPC分类号： G06T7/001 ,  G06T2207/30148

    摘要： Data converter apparatus for converting in real time data stored in an input compact format into an output expanded real time format. The data including a plurality of groups and repetition of the groups. The groups including, each, many basic geometric figures (BGF). The data converter includes a processor adapted to selecting data relating to a predetermined division, dividing and processing the data into consecutive bins according to scan order, which bins have structural correspondence to the input format. The data converter is further capable of sub-dividing the division into sub-divisions which have structural correspondence to the output format. The data processor is further capable of processing and allocating the BGFs in the bins to sub-divisions to thereby produce a division data stream in the output expanded real time format.

    摘要翻译： 数据转换装置，用于将以输入的小型格式存储的实时数据转换为输出扩展的实时格式。 数据包括多个组和组的重复。 这些组包括每个基本几何图形（BGF）。 数据转换器包括处理器，其适于选择与预定分区相关的数据，根据扫描顺序将数据划分和处理成连续的存储区，该存储单元与输入格式具有结构对应关系。 数据转换器还能够将分割划分成与输出格式具有结构对应关系的子分割。 数据处理器还能够处理并将分组中的BGF分配给子部分，从而以输出扩展的实时格式产生分割数据流。

    Alternating phase-shift mask inspection method and apparatus
    8.
    发明授权
    Alternating phase-shift mask inspection method and apparatus 有权

    公开(公告)号：US07072502B2

    公开(公告)日：2006-07-04

    申请号：US09876955

    申请日：2001-06-07

    申请人： Shirley Hemar ,  Alex Goldenshtein ,  Gadi Greenberg ,  Mula Friedman ,  Boaz Kenan

    发明人： Shirley Hemar ,  Alex Goldenshtein ,  Gadi Greenberg ,  Mula Friedman ,  Boaz Kenan

    IPC分类号： G06K9/00

    CPC分类号： G03F7/70483 ,  G01N21/95607 ,  G03F1/30 ,  G03F1/84

    摘要： A reticle inspection system and method for complete and fast inspection of phase shift mask reticles, both for incoming inspection and for periodic and pre-exposure inspection tool, is employable by facilities such as mask shops as an inspection tool compatible to the mask shop's customers. The inventive system and method detect phase errors in an aerial image by acquiring the image of the phase shift mask under the same optical conditions as the exposure conditions (i.e. wavelength, numerical aperture, sigma, and illumination aperture type). Images are acquired at a positive out-of-focus and a negative out-of-focus, and are compared in order to enhance possible phase error. The term “phase error” refers to the acceptable range of the phase deviation from the programmed 180° on the phase shift mask, by using the exposure system to achieve the image on the photoresist, satisfying the requirements of the wafer specification.