Invention Grant
- Patent Title: Gas flow control system with interlock
- Patent Title (中): 气体流量控制系统具有互锁性
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Application No.: US10141566Application Date: 2002-05-08
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Publication No.: US07354555B2Publication Date: 2008-04-08
- Inventor: Chih-Pen Yen , Jeng-Yann Tsay , Jeng-Chiang Chuang , Cheng-Fang Lin , Yung-Mao Hsu
- Applicant: Chih-Pen Yen , Jeng-Yann Tsay , Jeng-Chiang Chuang , Cheng-Fang Lin , Yung-Mao Hsu
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Tung & Associates
- Main IPC: B32B5/02
- IPC: B32B5/02 ; B32B27/04

Abstract:
A system for controlling the flow of gases into a reaction chamber used in processing semiconductor devices includes a safety interlock feature that prevents inadvertent mixing of incompatible, reactive gases. The interlock feature is implemented in an interlock control circuit which operates a valve system for individually controlling the flow of separate gases into the chamber. The interlock circuit includes a series of relay switches and timers arranged to create a time delay between the initiation of flow of gases from separate sources into the chamber.
Public/Granted literature
- US20030211015A1 Gas flow control system with interlock Public/Granted day:2003-11-13
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