公开(公告)号：US06815653B2

公开(公告)日：2004-11-09

申请号：US10122687

申请日：2002-04-15

申请人： Jenq-Yann Tsay ,  Jeng-Chiang Chuang ,  Chih-Pen Yen ,  Yung-Mao Hsu

发明人： Jenq-Yann Tsay ,  Jeng-Chiang Chuang ,  Chih-Pen Yen ,  Yung-Mao Hsu

IPC分类号： H01L21306

CPC分类号： H01J37/32431 ,  C23C16/4401 ,  G01J3/443 ,  G01N21/55 ,  G01N2021/8411 ,  G01N2021/8427 ,  H01J2237/0225

摘要： A method and apparatus for detecting material accretion and peeling in a system such as a plasma process chamber, including multiple optical sensors which are provided in the chamber above a gas distribution plate or other surface inside the chamber. The optical sensors are connected to a central process controller that is capable of terminating operation of the chamber and may be equipped with an alarm. In the event that the optical sensors detect asymmetries in brightness or light reflection among various portions or regions of the gas distribution plate or other surface, which asymmetries may indicate the formation of a material coating on the plate or dislodging of contaminant particles from the plate, a signal is sent to the process controller, which may be adapted to terminate the plasma process, alert operating personnel, or both.

摘要翻译： 一种用于检测诸如等离子体处理室的系统中的材料吸积和剥离的方法和装置，包括设置在气室内的气体分配板或室内的其他表面上的多个光学传感器。 光学传感器连接到能够终止腔室操作的中央过程控制器，并且可以配备有报警器。 在光学传感器检测气体分布板或其他表面的各个部分或区域之间的亮度或光反射不对称性的情况下，这种不对称性可指示板上的材料涂层的形成或从板上移除污染物颗粒， 信号被发送到过程控制器，其可以适于终止等离子体处理，警报操作人员或两者。

公开(公告)号：US5851343A

公开(公告)日：1998-12-22

申请号：US857961

申请日：1997-05-16

申请人： Yung-Mao Hsu ,  Ching-Chung Wu

发明人： Yung-Mao Hsu ,  Ching-Chung Wu

IPC分类号： H01J37/32 ,  C23F1/02 ,  C23C16/00

CPC分类号： H01J37/32477

摘要： The present invention provides a protective shield for a plasma etcher. The protective shield 40 protects the chamber wall 30 around the etch detect window from plasma etching and electrical arcing. The invention comprises a plasma etcher 10 has a wall 30 surrounding a chamber 14. The wall has an opening 16. The wall 30 having an inside face 30A and an outside face 30B. An opening edge 30C defines the opening 16. A window 24 covers over the opening 16 and over a portion of the outside face 30B of the wall. The protective shield 40 covers the opening edge 30C around the opening 16 and a portion of the inside face 30A of the wall 30 around the opening 16. The shield 40 is composed of an electrically insulating and plasma resistant material whereby the protective shield 40 prevents the chamber from arching and generating particles and extends the lifetime of the wall 30.

摘要翻译： 本发明提供了一种用于等离子体蚀刻器的保护罩。 保护罩40保护围绕蚀刻检测窗口的室壁30等离子体蚀刻和电弧。 本发明包括等离子体蚀刻器10，其具有围绕室14的壁30.壁具有开口16.壁30具有内侧面30A和外侧面30B。 开口边缘30C限定开口16.窗口24覆盖在开口16上方和壁的外表面30B的一部分上方。 保护罩40围绕开口16覆盖开口边缘30C，围绕开口16覆盖壁30的内侧面30A的一部分。屏蔽40由电绝缘等离子体材料构成，由此保护屏蔽40防止 室从拱起并产生颗粒并延长壁30的寿命。

公开(公告)号：US5697839A

公开(公告)日：1997-12-16

申请号：US679912

申请日：1996-07-15

申请人： Ying-Hsiang Chen ,  Wei-Yao Chien ,  Deh-Hsiung Peng ,  Yung-Mao Hsu

发明人： Ying-Hsiang Chen ,  Wei-Yao Chien ,  Deh-Hsiung Peng ,  Yung-Mao Hsu

IPC分类号： B08B15/02

CPC分类号： B08B15/026

摘要： An apparatus for venting hazardous effluents from process equipment used in the manufacture of semiconductors, which is part of a larger ventilating system, is a "see-thru" transparent chamber which performs the function of a hood, and can be mounted on any one of the conventional semiconductor processing equipment. Because it is transparent, the operator can easily determine when to clean the hood. This is important from the point of view of not exposing the work piece in the processing equipment to effluent contaminants. Usually, the effluents are hazardous to health. Hence, the apparatus is equipped with a pair of gloves which are an integral part of an access door to the hood, and is used to manipulate remotely cleaning tools that are kept inside said hood: remote in the sense that the operator is never exposed to the hazardous effluents inside the chamber hood, and yet is easily capable of using the cleaning tools inside the hood by means of the pair gloves that are an integral part of the hood. The throughput of the manufacturing line is favorably affected since cleaning can be accomplished without stopping the process taking place in the semiconductor manufacturing line.

摘要翻译： 用于制造半导体的工艺设备中排放危险废液的装置是作为较大通风系统的一部分的“透明”透明室，其执行罩的功能，并且可以安装在任何一个 传统的半导体加工设备。 因为它是透明的，操作者可以很容易地确定何时清洁罩。 从处理设备中的工件不会暴露于污染物的观点来看，这一点很重要。 通常，流出物对健康有害。 因此，该装置配备有一对手套，这些手套是通向发动机盖的入口门的组成部分，并且用于操纵保持在所述罩内的远程清洁工具：远离操作者从未暴露于 腔室罩内的危险废液，但是通过作为罩的组成部分的成对手套，能够容易地使用罩内的清洁工具。 生产线的生产能力受到影响，因为可以在不停止在半导体生产线中发生的工艺的情况下完成清洁。

公开(公告)号：US07354555B2

公开(公告)日：2008-04-08

申请号：US10141566

申请日：2002-05-08

申请人： Chih-Pen Yen ,  Jeng-Yann Tsay ,  Jeng-Chiang Chuang ,  Cheng-Fang Lin ,  Yung-Mao Hsu

发明人： Chih-Pen Yen ,  Jeng-Yann Tsay ,  Jeng-Chiang Chuang ,  Cheng-Fang Lin ,  Yung-Mao Hsu

IPC分类号： B32B5/02 ,  B32B27/04

CPC分类号： G05D7/0658

摘要： A system for controlling the flow of gases into a reaction chamber used in processing semiconductor devices includes a safety interlock feature that prevents inadvertent mixing of incompatible, reactive gases. The interlock feature is implemented in an interlock control circuit which operates a valve system for individually controlling the flow of separate gases into the chamber. The interlock circuit includes a series of relay switches and timers arranged to create a time delay between the initiation of flow of gases from separate sources into the chamber.

摘要翻译： 用于控制进入用于处理半导体器件的反应室中的气体流的系统包括防止不相容的反应性气体的无意混合的安全互锁特征。 互锁特征在互锁控制电路中实现，该互锁控制电路操作一个阀门系统，用于单独控制分离气体进入腔室的流量。 互锁电路包括一系列继电器开关和定时器，其布置成在从单独的源流入腔室的气体的开始流动之间产生时间延迟。