公开(公告)号：US07354555B2

公开(公告)日：2008-04-08

申请号：US10141566

申请日：2002-05-08

申请人： Chih-Pen Yen ,  Jeng-Yann Tsay ,  Jeng-Chiang Chuang ,  Cheng-Fang Lin ,  Yung-Mao Hsu

发明人： Chih-Pen Yen ,  Jeng-Yann Tsay ,  Jeng-Chiang Chuang ,  Cheng-Fang Lin ,  Yung-Mao Hsu

IPC分类号： B32B5/02 ,  B32B27/04

CPC分类号： G05D7/0658

摘要： A system for controlling the flow of gases into a reaction chamber used in processing semiconductor devices includes a safety interlock feature that prevents inadvertent mixing of incompatible, reactive gases. The interlock feature is implemented in an interlock control circuit which operates a valve system for individually controlling the flow of separate gases into the chamber. The interlock circuit includes a series of relay switches and timers arranged to create a time delay between the initiation of flow of gases from separate sources into the chamber.

摘要翻译： 用于控制进入用于处理半导体器件的反应室中的气体流的系统包括防止不相容的反应性气体的无意混合的安全互锁特征。 互锁特征在互锁控制电路中实现，该互锁控制电路操作一个阀门系统，用于单独控制分离气体进入腔室的流量。 互锁电路包括一系列继电器开关和定时器，其布置成在从单独的源流入腔室的气体的开始流动之间产生时间延迟。

公开(公告)号：US06815653B2

公开(公告)日：2004-11-09

申请号：US10122687

申请日：2002-04-15

申请人： Jenq-Yann Tsay ,  Jeng-Chiang Chuang ,  Chih-Pen Yen ,  Yung-Mao Hsu

发明人： Jenq-Yann Tsay ,  Jeng-Chiang Chuang ,  Chih-Pen Yen ,  Yung-Mao Hsu

IPC分类号： H01L21306

CPC分类号： H01J37/32431 ,  C23C16/4401 ,  G01J3/443 ,  G01N21/55 ,  G01N2021/8411 ,  G01N2021/8427 ,  H01J2237/0225

摘要： A method and apparatus for detecting material accretion and peeling in a system such as a plasma process chamber, including multiple optical sensors which are provided in the chamber above a gas distribution plate or other surface inside the chamber. The optical sensors are connected to a central process controller that is capable of terminating operation of the chamber and may be equipped with an alarm. In the event that the optical sensors detect asymmetries in brightness or light reflection among various portions or regions of the gas distribution plate or other surface, which asymmetries may indicate the formation of a material coating on the plate or dislodging of contaminant particles from the plate, a signal is sent to the process controller, which may be adapted to terminate the plasma process, alert operating personnel, or both.

摘要翻译： 一种用于检测诸如等离子体处理室的系统中的材料吸积和剥离的方法和装置，包括设置在气室内的气体分配板或室内的其他表面上的多个光学传感器。 光学传感器连接到能够终止腔室操作的中央过程控制器，并且可以配备有报警器。 在光学传感器检测气体分布板或其他表面的各个部分或区域之间的亮度或光反射不对称性的情况下，这种不对称性可指示板上的材料涂层的形成或从板上移除污染物颗粒， 信号被发送到过程控制器，其可以适于终止等离子体处理，警报操作人员或两者。

公开(公告)号：US06708565B2

公开(公告)日：2004-03-23

申请号：US10133784

申请日：2002-04-26

申请人： Chein-Fang Lin ,  Jeng-Yann Tsay ,  Chih-Pen Yen ,  Yong-Mao Hsu

发明人： Chein-Fang Lin ,  Jeng-Yann Tsay ,  Chih-Pen Yen ,  Yong-Mao Hsu

IPC分类号： G01M122

CPC分类号： H01L21/67259 ,  G01H9/008 ,  G01N29/07 ,  G01N2291/101 ,  G01N2291/105 ,  G01S15/10 ,  G01S15/88

摘要： Detecting blade vibration via ultrasonic waves is disclosed. The blade may be part of a robot that is used in conjunction with semiconductor device fabrication. A process chamber is provided that has a sidewall and a base defining a cavity contained therein. A rotatable blade is mounted at a center of the cavity that has a base portion and a tip portion extensible from the center to the sidewall of the process chamber. One or more ultrasonic sensors are mounted on the base adjacent to the sidewall. Ultrasonic waves are sent and received toward and reflected by the tip portion of the wafer blade to determine the tip portion's position. In this way, vibrational movement of the blade can be detected.

摘要翻译： 公开了通过超声波检测刀片振动。 刀片可以是与半导体器件制造一起使用的机器人的一部分。 提供处理室，其具有侧壁和限定其中容纳的空腔的底座。 可旋转叶片安装在空腔的中心处，该中心具有从处理室的中心延伸到侧壁的基部和尖端部分。 一个或多个超声波传感器安装在邻近侧壁的底座上。 超声波被发送并接收到晶片叶片的尖端部分并被其反射，以确定尖端部分的位置。 以这种方式，可以检测到叶片的振动。