Invention Grant
- Patent Title: DRAM memory cell
- Patent Title (中): DRAM存储单元
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Application No.: US10839800Application Date: 2004-05-06
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Publication No.: US07368752B2Publication Date: 2008-05-06
- Inventor: Richard J. Luyken , Franz Hofmann , Lothar Risch , Dirk Manger , Wolfgang Rösner , Till Schlösser , Michael Specht
- Applicant: Richard J. Luyken , Franz Hofmann , Lothar Risch , Dirk Manger , Wolfgang Rösner , Till Schlösser , Michael Specht
- Applicant Address: DE Munich
- Assignee: Infineon Technologies AG
- Current Assignee: Infineon Technologies AG
- Current Assignee Address: DE Munich
- Agency: Morrison & Foerster LLP
- Priority: DE10320239 20030507
- Main IPC: H01L27/108
- IPC: H01L27/108 ; H01L29/12 ; H01L31/112

Abstract:
A DRAM memory cell is provided with a selection transistor, which is arranged horizontally at a semiconductor substrate surface and has a first source/drain electrode, a second source/drain electrode, a channel layer arranged between the first and the second source/drain electrode in the semiconductor substrate, and a gate electrode, which is arranged along the channel layer and is electrically insulated from the channel layer, a storage capacitor, which has a first capacitor electrode and a second capacitor electrode, insulated from the first capacitor electrode, one of the capacitor electrodes of the storage capacitor being electrically conductively connected to one of the source/drain electrodes of the selection transistor, and a semiconductor substrate electrode on the rear side, the gate electrode enclosing the channel layer at at least two opposite sides.
Public/Granted literature
- US20040266088A1 DRAM memory cell and method for fabricating such a DRAM memory cell Public/Granted day:2004-12-30
Information query
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