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发明授权
US07663125B2 Ion beam current uniformity monitor, ion implanter and related method 有权
离子束电流均匀性监测仪，离子注入机及相关方法

Ion beam current uniformity monitor, ion implanter and related method
摘要：
An ion beam current uniformity monitor, ion implanter and related method are disclosed. In one embodiment, the ion beam current uniformity monitor includes an ion beam current measurer including a plurality of measuring devices for measuring a current of an ion beam at a plurality of locations; and a controller for maintaining ion beam current uniformity based on the ion beam current measurements by the ion beam current measurer.
摘要（中）：

公开了一种离子束电流均匀性监测器，离子注入机及相关方法。 在一个实施例中，离子束电流均匀性监测器包括离子束电流测量器，其包括用于测量多个位置处的离子束电流的多个测量装置; 以及基于离子束电流测量器的离子束电流测量来维持离子束电流均匀性的控制器。

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