利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

5 条记录 (耗时 0.011 秒)

    Ion beam implant current, spot width and position tuning
    2.
    发明授权
    Ion beam implant current, spot width and position tuning 有权
    离子束注入电流，光斑宽度和位置调整

    公开(公告)号：US07442944B2

    公开(公告)日：2008-10-28

    申请号：US10960904

    申请日：2004-10-07

    申请人： Shengwu Chang ,  Antonella Cucchetti ,  Joseph P. Dzengeleski ,  Gregory R. Gibilaro ,  Rosario Mollica ,  Gregg A. Norris ,  Joseph C. Olson ,  Marie J. Welsch

    发明人： Shengwu Chang ,  Antonella Cucchetti ,  Joseph P. Dzengeleski ,  Gregory R. Gibilaro ,  Rosario Mollica ,  Gregg A. Norris ,  Joseph C. Olson ,  Marie J. Welsch

    IPC分类号： H01J37/317

    CPC分类号： H01J37/3171 ,  H01J2237/24542 ,  H01J2237/30461 ,  H01J2237/31703

    摘要： An ion beam tuning method, system and program product for tuning an ion implanter system are disclosed. The invention obtains an ion beam profile of the ion beam by, for example, scanning the ion beam across a profiler that is within an implant chamber; and tunes the ion implanter system to maximize an estimated implant current based on the ion beam profile to simultaneously optimize total ion beam current and ion beam spot width, and maximize implant current. In addition, the tuning can also position the ion beam along a desired ion beam path based on the feedback of the spot beam center, which improves ion implanter system productivity and performance by reducing ion beam setup time and provides repeatable beam angle performance for each ion beam over many setups.

    摘要翻译： 公开了用于调整离子注入机系统的离子束调谐方法，系统和程序产品。 本发明通过例如扫描离子束通过植入室内的轮廓仪获得离子束的离子束轮廓; 并调整离子注入系统，以根据离子束轮廓最大化估计的注入电流，以同时优化总离子束电流和离子束斑点宽度，并最大化注入电流。 此外，调谐还可以基于点光束中心的反馈沿着期望的离子束路径定位离子束，其通过减少离子束建立时间改善离子注入系统的生产率和性能，并为每个离子提供可重复的射束角度性能 横跨许多设置。

    Methods and apparatus for beam density measurement in two dimensions
    4.
    发明申请
    Methods and apparatus for beam density measurement in two dimensions 有权
    二维光束密度测量的方法和装置

    公开(公告)号：US20080073550A1

    公开(公告)日：2008-03-27

    申请号：US11477335

    申请日：2006-06-29

    申请人： Atul Gupta ,  Joseph C. Olson ,  Gregg A. Norris

    发明人： Atul Gupta ,  Joseph C. Olson ,  Gregg A. Norris

    IPC分类号： G01K1/08

    CPC分类号： H01J37/3171 ,  G01J1/04 ,  G01J1/0437 ,  G01J1/0448 ,  G01J1/4257 ,  G01J2001/4261 ,  H01J37/244 ,  H01J2237/2446 ,  H01J2237/24507 ,  H01J2237/24542 ,  H01J2237/24578 ,  H01J2237/30472 ,  H01J2237/31703

    摘要： A beam density measurement system includes a shield, a beam sensor, and an actuator. The beam sensor is positioned downstream from the shield in a direction of travel of a beam. The beam sensor is configured to sense an intensity of the beam, and the beam sensor has a long dimension and a short dimension. The actuator translates the shield relative to the beam sensor, wherein the shield blocks at least a portion of the beam from the beam sensor as the shield is translated relative to the beam sensor, and wherein measured values of the intensity associated with changes in a position of the shield relative to the beam sensor are representative of a beam density distribution of the beam in a first direction defined by the long dimension of the beam sensor.

    摘要翻译： 光束密度测量系统包括屏蔽，光束传感器和致动器。 光束传感器沿着光束的行进方向定位在屏蔽的下游。 光束传感器被配置为感测光束的强度，并且光束传感器具有长尺寸和短尺寸。 执行器相对于光束传感器平移屏蔽，其中当屏蔽件相对于光束传感器平移时，屏蔽件阻挡来自光束传感器的光束的至少一部分，并且其中与位置变化相关联的强度的测量值 屏蔽物相对于光束传感器的光束密度分布代表由光束传感器的长尺寸限定的第一方向上的光束的光束密度分布。