Invention Grant
- Patent Title: Integrated circuit including a gate electrode
- Patent Title (中): 集成电路包括栅电极
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Application No.: US11926653Application Date: 2007-10-29
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Publication No.: US07829892B2Publication Date: 2010-11-09
- Inventor: Richard Johannes Luyken , Franz Hofmann , Lothar Risch , Dirk Manger , Wolfgang Roesner , Till Schloesser , Michael Specht
- Applicant: Richard Johannes Luyken , Franz Hofmann , Lothar Risch , Dirk Manger , Wolfgang Roesner , Till Schloesser , Michael Specht
- Applicant Address: DE Munich
- Assignee: Qimonda AG
- Current Assignee: Qimonda AG
- Current Assignee Address: DE Munich
- Agency: Dicke, Billig & Czaja, PLLC
- Priority: DE10320239 20030507
- Main IPC: H01L29/12
- IPC: H01L29/12

Abstract:
An integrated circuit including a gate electrode is disclosed. One embodiment provides a transistor including a first source/drain electrode and a second source/drain electrode. A channel is arranged between the first and the second source/drain electrode in a semiconductor substrate. A gate electrode is arranged adjacent the channel layer and is electrically insulated from the channel layer. A semiconductor substrate electrode is provided on a rear side. The gate electrode encloses the channel layer at least two opposite sides.
Public/Granted literature
- US20080054324A1 INTEGRATED CIRCUIT INCLUDING A GATE ELECTRODE Public/Granted day:2008-03-06
Information query
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