发明授权
- 专利标题： Methods for nanowire alignment and deposition
- 专利标题（中）： 纳米线对准和沉积的方法
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申请号： US11979949申请日： 2007-11-09
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公开(公告)号： US07968474B2公开(公告)日： 2011-06-28
- 发明人: Samuel Martin , Xiangfeng Duan , Katsumasa Fujii , James M. Hamilton , Hiroshi Iwata , Francisco Leon , Jeffrey Miller , Tetsu Negishi , Hiroshi Ohki , J. Wallace Parce , Cheri X. Y. Pereira , Paul John Schuele , Akihide Shibata , David P. Stumbo , Yasunobu Okada
- 申请人： Samuel Martin , Xiangfeng Duan , Katsumasa Fujii , James M. Hamilton , Hiroshi Iwata , Francisco Leon , Jeffrey Miller , Tetsu Negishi , Hiroshi Ohki , J. Wallace Parce , Cheri X. Y. Pereira , Paul John Schuele , Akihide Shibata , David P. Stumbo , Yasunobu Okada
- 申请人地址： US CA Mountain View JP Osaka
- 专利权人： Nanosys, Inc.,Sharp Kabushiki Kaisha
- 当前专利权人： Nanosys, Inc.,Sharp Kabushiki Kaisha
- 当前专利权人地址： US CA Mountain View JP Osaka
- 代理机构： Sterne, Kessler, Goldstein & Fox P.L.L.C.
- 主分类号： H01L21/71
- IPC分类号： H01L21/71
摘要：
The present invention provides methods and systems for nanowire alignment and deposition. Energizing (e.g., an alternating current electric field) is used to align and associate nanowires with electrodes. By modulating the energizing, the nanowires are coupled to the electrodes such that they remain in place during subsequent wash and drying steps. The invention also provides methods for transferring nanowires from one substrate to another in order to prepare various device substrates. The present invention also provides methods for monitoring and controlling the number of nanowires deposited at a particular electrode pair, as well as methods for manipulating nanowires in solution.
公开/授权文献
- US20080224123A1 Methods for nanowire alignment and deposition 公开/授权日：2008-09-18