Invention Grant
- Patent Title: Method of manufacturing substrate using a carrier
- Patent Title (中): 使用载体制造衬底的方法
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Application No.: US13137631Application Date: 2011-08-30
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Publication No.: US08677618B2Publication Date: 2014-03-25
- Inventor: Ki Hwan Kim , Jin Yong An , Myung Sam Kang
- Applicant: Ki Hwan Kim , Jin Yong An , Myung Sam Kang
- Applicant Address: KR Suwon
- Assignee: Samsung Electro-Mechanics Co., Ltd.
- Current Assignee: Samsung Electro-Mechanics Co., Ltd.
- Current Assignee Address: KR Suwon
- Priority: KR10-2008-0128642 20081217
- Main IPC: H05K3/02
- IPC: H05K3/02 ; H05K3/10

Abstract:
A method of manufacturing a substrate using a carrier, that includes preparing a carrier having a releasing layer, and insulating layers and metal layers sequentially disposed on both sides of the releasing layer; patterning the metal layers to form base circuit layers; forming buildup layers on the base circuit layers; executing a routing process to separate the insulating layers from the releasing layer; and forming solder resist layers on the buildup layers and forming openings in the solder resist layers and the insulating layers to expose pads.
Public/Granted literature
- US20110318480A1 Method of manufacturing substrate using a carrier Public/Granted day:2011-12-29
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