发明授权
- 专利标题: Apparatus and method for recovering liquid droplets in immersion lithography
- 专利标题(中): 浸没式光刻液液滴回收装置及方法
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申请号: US13064232申请日: 2011-03-11
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公开(公告)号: US08780323B2公开(公告)日: 2014-07-15
- 发明人: Alex Ka Tim Poon , Leonard Wai Fung Kho , Gaurav Keswani
- 申请人: Alex Ka Tim Poon , Leonard Wai Fung Kho , Gaurav Keswani
- 申请人地址: JP Tokyo
- 专利权人: Nikon Corporation
- 当前专利权人: Nikon Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Oliff PLC
- 主分类号: G03B27/52
- IPC分类号: G03B27/52 ; G03F7/20
摘要:
Immersion fluid remaining on a portion of a substrate after that portion has passed an immersion nozzle is removed by moving the substrate relative to an immersion nozzle so that the portion of the substrate on which the immersion fluid remains is passed by the immersion nozzle again. A path is determined along which the substrate is to be moved to remove the remaining immersion fluid. The path can be determined based upon previous movements of the substrate, including factors such as the speed and/or length of the previous movements. Alternatively, portions of the substrate on which immersion fluid remains can be detected, and then the substrate can be moved so that the portion of the substrate on which the immersion fluid remains is passed by the immersion nozzle based on the results of the detection. Immersion fluid also can be removed from the stage surface located beyond the substrate.
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