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公开(公告)号：US08610873B2
公开(公告)日：2013-12-17
申请号：US12382100
申请日：2009-03-09
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03B27/52
摘要： An immersion lithography apparatus includes a projection system having a final optical element and a stage that is movable to a position below the projection system such that a gap exists between the final optical element and a surface of the stage. An immersion liquid fills the gap between the surface and the final optical element. A liquid confinement member maintains the immersion liquid in the gap. The immersion liquid has a meniscus where the liquid contacts ambient gas, the meniscus defining a footprint of an immersion area. A movable liquid diverter is positioned between the liquid confinement member and the stage. The movable liquid diverter moves relative to the liquid confinement member in a direction parallel to the surface of the stage, and includes an opening that surrounds the immersion area, the opening contacting or being slightly spaced from the immersion area when the stage is stationary.
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公开(公告)号：US20100231876A1
公开(公告)日：2010-09-16
申请号：US12801081
申请日：2010-05-20
IPC分类号： G03B27/52
CPC分类号： G03F7/70341
摘要： Apparatus and methods recover a fluid from an immersion area formed in a gap between a projection system and an object of exposure in an immersion lithography system. Liquid is supplied through a supply inlet. A porous member is disposed adjacent to a space. The porous member includes a first portion and a second portion. A recovery capability to remove the supplied liquid from the space through the first portion is different from a recovery capability to remove the supplied liquid from the space through the second portion.
摘要翻译： 设备和方法从浸没式光刻系统中的投影系统和曝光对象之间的间隙中形成的浸没区域中回收流体。 液体通过供应入口供应。 多孔构件邻近空间设置。 多孔构件包括第一部分和第二部分。 通过第一部分从空间去除供应的液体的恢复能力不同于通过第二部分从空间移除供应的液体的恢复能力。
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公开(公告)号：US20090002648A1
公开(公告)日：2009-01-01
申请号：US11987788
申请日：2007-12-04
IPC分类号： G03B27/52
CPC分类号： G03F7/70341
摘要： A gas curtain type immersion lithography apparatus has a fluid removing porous region adjacent the gas inlet to prevent evaporative cooling. The apparatus includes a substrate holder which holds a substrate having an imaging surface and a projection optical system having a last optical element. The projection optical system projects an image onto a target imaging area on the substrate through an immersion fluid filled in a gap between the imaging surface of the substrate and the last optical element. An immersion element maintains the immersion fluid in the gap. Gas is provided through an inlet into the gap. A porous region is provided adjacent the gas inlet. Immersion fluid that collects near the gas inlet is removed by the porous region.
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4.发明申请Apparatus, systems and methods for removing liquid from workpiece during workpiece processing 审中-公开在工件加工过程中从工件上清除液体的设备，系统和方法公开(公告)号：US20080225248A1
公开(公告)日：2008-09-18
申请号：US12073865
申请日：2008-03-11
CPC分类号： G03F7/70341
摘要： Apparatus, systems and methods remove liquid from a workpiece. A first station subjects a workpiece to processing that leaves a liquid on a surface of the workpiece. A second station is disposed at a location spaced apart from the first station. A porous member is disposed between the first and second stations. The porous member has a liquid-phyllic surface that faces the workpiece and is spaced from a surface of the workpiece by a gap. The porous member has a length in a direction perpendicular to a movement direction in which the workpiece moves from the first station to the second station, the length being at least as large as a dimension of the workpiece in the direction perpendicular to the movement direction.
摘要翻译： 设备，系统和方法从工件中清除液体。 第一工位对工件进行处理，在工件的表面上留下液体。 第二站设置在与第一站间隔开的位置处。 多孔构件设置在第一和第二站之间。 多孔构件具有面向工件的液态表面，并且与工件的表面间隔开间隙。 多孔构件具有与工件从第一工位移动到第二工位的移动方向垂直的方向上的长度，其长度至少与工件沿与移动方向垂直的方向的尺寸一样大。
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5.发明申请Apparatus and methods for keeping immersion fluid adjacent to an optical assembly during wafer exchange in an immersion lithography machine 有权在浸没式光刻机中的晶片更换期间将浸没流体保持在光学组件附近的装置和方法公开(公告)号：US20080225246A1
公开(公告)日：2008-09-18
申请号：US11976898
申请日：2007-10-29
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03F7/70733
摘要： Apparatus and methods keep immersion liquid in a space adjacent to an optical assembly. An optical assembly projects an image onto a substrate supported adjacent to the optical assembly by a substrate table. An insertion member insertable into the space between the optical assembly and the substrate, the substrate table, or both, divides the immersion liquid into a first portion and a second portion, the first portion disposed between the optical assembly and the insertion member, and the second portion disposed between the insertion member and the substrate, the substrate table, or both. The insertion member keeps the optical assembly in contact with the first portion when the substrate is moved away from being disposed adjacent to the optical assembly.
摘要翻译： 装置和方法将浸没液体保持在与光学组件相邻的空间中。 光学组件通过衬底台将图像投影到靠近光学组件支撑的衬底上。 可插入到光学组件和衬底之间的空间，衬底台或两者中的插入构件将浸没液体分成第一部分和第二部分，第一部分设置在光学组件和插入构件之间， 第二部分设置在插入构件和衬底之间，衬底台或两者。 当基板移动远离邻近光学组件时，插入构件保持光学组件与第一部分接触。
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6.发明申请Exposure apparatus that includes a phase change circulation system for movers 审中-公开包括移动器的相变循环系统的曝光装置公开(公告)号：US20080073563A1
公开(公告)日：2008-03-27
申请号：US11479628
申请日：2006-07-01
申请人： W. Thomas Novak , Michael Binnard , Alex Ka Tim Poon , Masahiro Totsu , Leonard Wai Fung Kho , Gaurav Keswani
发明人： W. Thomas Novak , Michael Binnard , Alex Ka Tim Poon , Masahiro Totsu , Leonard Wai Fung Kho , Gaurav Keswani
IPC分类号： G01F23/00
CPC分类号： G03F7/70875 , G03F7/70758 , H01L21/67248 , H01L21/68 , H02K9/20 , H02K41/02
摘要： A mover combination (226) for moving and positioning a device (34) includes a mover (328) that defines a fluid passageway (370) and a circulation system (330) having a passageway inlet (374) and a passageway outlet (376). The circulation system (330) directs a circulation fluid (378) into the fluid passageway (370). The circulation system (330) can include a liquid/gas separator (384) that is in fluid communication with the fluid passageway (370). With this design, the plumbing for the liquid (378A) and the gas (378B) can each be optimized. Additionally, the circulation system (330) can include a pressure control device (388) that controls the pressure of the circulation fluid (378) in at least a portion of the fluid passageway (370). With this design, the pressure control device (388) controls the pressure of the circulation fluid (378) near the fluid passageway (370) so that the temperature of the circulation fluid (378) at the passageway outlet (376) is approximately equal to the temperature of the circulation fluid (378) at the passageway inlet (374). Moreover, the circulation system (930) can include a pump assembly (980) that directs the circulation fluid (978) into the passageway inlet (974), and a pressure control device (996) that precisely controls a state of the circulation fluid (978) near the passageway inlet (974). With this design, the phase of the circulation fluid (978) at the passageway inlet (974) can be precisely controlled without restricting the flow of the circulation fluid (978).
摘要翻译： 用于移动和定位装置（34）的移动器组合（226）包括限定流体通道（370）的移动器（328）和具有通道入口（374）和通道出口（376）的循环系统（330） 。 循环系统（330）将循环流体（378）引导到流体通道（370）中。 循环系统（330）可以包括与流体通道（370）流体连通的液体/气体分离器（384）。 通过这种设计，可以优化液体（378A）和气体（378B）的管道。 另外，循环系统（330）可以包括控制流体通道（370）的至少一部分中的循环流体（378）的压力的压力控制装置（388）。 通过该设计，压力控制装置（388）控制流体通道（370）附近的循环流体（378）的压力，使得通道出口（376）处的循环流体（378）的温度近似等于 通道入口处的循环流体（378）的温度（374）。 此外，循环系统（930）可以包括引导循环流体（978）进入通道入口（974）的泵组件（980）和精确地控制循环流体的状态的压力控制装置（996） 978）在通道入口附近（974）。 通过这种设计，可以精确地控制在通道入口（974）处的循环流体（978）的相位，而不限制循环流体（978）的流动。
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公开(公告)号：US08934080B2
公开(公告)日：2015-01-13
申请号：US13617251
申请日：2012-09-14
IPC分类号： G03F7/20
CPC分类号： G03F7/70341
摘要： An immersion lithography apparatus includes a projection system having a final optical element, a movable stage that is movable below the projection system such that a gap exists between the final optical element and a surface of the stage, an immersion liquid being filled in the gap, a liquid confinement member and a liquid diverter. The liquid confinement member maintains the immersion liquid in the gap, and includes a liquid recovery portion that faces the stage surface and recovers liquid from the gap. The liquid recovery portion includes a first porous portion through which a first suction force is applied and a second porous portion through which a second suction force less than the first suction force is applied, the second portion being located outward of the first portion. The liquid diverter is positioned between the stage and at least the first porous portion.
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8.发明授权公开(公告)号：US08780323B2
公开(公告)日：2014-07-15
申请号：US13064232
申请日：2011-03-11
CPC分类号： G03F7/70925 , G03B27/42 , G03F7/70341 , G03F7/70725
摘要： Immersion fluid remaining on a portion of a substrate after that portion has passed an immersion nozzle is removed by moving the substrate relative to an immersion nozzle so that the portion of the substrate on which the immersion fluid remains is passed by the immersion nozzle again. A path is determined along which the substrate is to be moved to remove the remaining immersion fluid. The path can be determined based upon previous movements of the substrate, including factors such as the speed and/or length of the previous movements. Alternatively, portions of the substrate on which immersion fluid remains can be detected, and then the substrate can be moved so that the portion of the substrate on which the immersion fluid remains is passed by the immersion nozzle based on the results of the detection. Immersion fluid also can be removed from the stage surface located beyond the substrate.
摘要翻译： 通过移动衬底相对于浸入式喷嘴使基板的剩余部分已经通过浸入式喷嘴的方式残留在基板的一部分上的浸入流体，使得残留有浸没流体的基板部分再次被浸入式喷嘴通过。 确定要移动衬底以移除剩余浸没流体的路径。 该路径可以基于先前的基底移动来确定，包括先前移动的速度和/或长度等因素。 或者，可以检测浸入液体残留的基板的部分，然后基于检测结果，移动基板以使浸没流体保留的基板的部分通过浸渍喷嘴。 浸没流体也可以从位于基底之外的载物台表面除去。
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公开(公告)号：US20090237631A1
公开(公告)日：2009-09-24
申请号：US12379419
申请日：2009-02-20
IPC分类号： G03B27/52
CPC分类号： G03F7/70341
摘要： An immersion lithography apparatus includes a projection system having a final optical element, a movable stage that is movable below the projection system such that a gap exists between the final optical element and a surface of the stage, an immersion liquid being filled in the gap, a liquid confinement member and a liquid diverter. The liquid confinement member maintains the immersion liquid in the gap, and includes a liquid recovery portion that faces the stage surface and recovers liquid from the gap. The liquid recovery portion includes a first porous portion through which a first suction force is applied and a second porous portion through which a second suction force less than the first suction force is applied, the second portion being located outward of the first portion. The liquid diverter is positioned between the stage and at least the first porous portion.
摘要翻译： 浸没式光刻设备包括具有最终光学元件的投影系统，在投影系统下方可移动的可移动平台，使得在最终光学元件与台面的表面之间存在间隙，浸没液体填充在间隙中， 液体限制构件和液体分配器。 液体限制部件将浸没液体保持在间隙中，并且包括面向台面的液体回收部，并从间隙回收液体。 液体回收部分包括施加第一吸力的第一多孔部分和施加小于第一吸力的第二吸力的第二多孔部分，第二部分位于第一部分的外侧。 液体转向器位于台架和至少第一多孔部分之间。
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10.发明申请Immersion lithography apparatus and method having movable liquid diverter between immersion liquid confinement member and substrate 有权浸没式光刻设备和方法，在浸没液体限制构件和衬底之间具有可移动的液体转向器公开(公告)号：US20090231560A1
公开(公告)日：2009-09-17
申请号：US12382100
申请日：2009-03-09
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03B27/52
摘要： An immersion lithography apparatus includes a projection system having a final optical element and a stage that is movable to a position below the projection system such that a gap exists between the final optical element and a surface of the stage. An immersion liquid fills the gap between the surface and the final optical element. A liquid confinement member maintains the immersion liquid in the gap. The immersion liquid has a meniscus where the liquid contacts ambient gas, the meniscus defining a footprint of an immersion area. A movable liquid diverter is positioned between the liquid confinement member and the stage. The movable liquid diverter moves relative to the liquid confinement member in a direction parallel to the surface of the stage, and includes an opening that surrounds the immersion area, the opening contacting or being slightly spaced from the immersion area when the stage is stationary.
摘要翻译： 浸没光刻设备包括具有最终光学元件的投影系统和可移动到投影系统下方的位置的台架，使得在最终光学元件与台面的表面之间存在间隙。 浸没液体填充表面和最终光学元件之间的间隙。 液体限制构件将浸没液体保持在间隙中。 浸没液体具有弯液面，其中液体接触环境气体，弯月面限定了浸没区域的覆盖区域。 可移动的液体转向器位于液体限制构件和载物台之间。 可移动液体分配器在平行于载物台表面的方向上相对于液体限制构件移动，并且包括围绕浸没区域的开口，当平台静止时，开口接触或与浸没区域稍微间隔开。
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