发明授权
- 专利标题: Apparatus for depositing a multilayer coating on discrete sheets
- 专利标题(中): 用于在离散片材上沉积多层涂层的装置
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申请号: US10412133申请日: 2003-04-11
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公开(公告)号: US08808457B2公开(公告)日: 2014-08-19
- 发明人: John Chris Pagano , Kenneth Jeffrey Nelson , Paul E. Burrows , Mark Edward Gross , Mac R. Zumhoff , Peter Maclyn Martin , Charles C. Bonham , Gordon Lee Graff , Lorenza Moro , Xi Chu
- 申请人: John Chris Pagano , Kenneth Jeffrey Nelson , Paul E. Burrows , Mark Edward Gross , Mac R. Zumhoff , Peter Maclyn Martin , Charles C. Bonham , Gordon Lee Graff , Lorenza Moro , Xi Chu
- 申请人地址: KR
- 专利权人: Samsung Display Co., Ltd.
- 当前专利权人: Samsung Display Co., Ltd.
- 当前专利权人地址: KR
- 代理机构: Dinsmore & Shohl LLP
- 主分类号: C23C16/00
- IPC分类号: C23C16/00 ; C23C14/00 ; B05D7/00 ; C23C14/58 ; C23C16/54 ; H01L21/67 ; H01L51/00 ; H01L51/56
摘要:
A tool for depositing multilayer coatings onto a substrate. The tool includes a housing defining a vacuum chamber connected to a vacuum source, deposition stations each configured to deposit a layer of multilayer coating on the substrate, a curing station, and a contamination reduction device. At least one of the deposition stations is configured to deposit an inorganic layer, while at least one other deposition station is configured to deposit an organic layer. In one tool configuration, the substrate may travel back and forth through the tool as many times as needed to achieve the desired number of layers of multilayer coating. In another, the tool may include numerous housings adjacently spaced such that the substrate may make a single unidirectional pass. The contamination reduction device may be configured as one or more migration control chambers about at least one of the deposition stations, and further includes cooling devices, such as chillers, to reduce the presence of vaporous layer precursors. The tool is particularly well-suited to depositing multilayer coatings onto flexible substrates, as well as to encapsulating environmentally-sensitive devices placed on the flexible substrate.
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