Invention Grant
- Patent Title: Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same
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Application No.: US13617781Application Date: 2012-09-14
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Publication No.: US08871429B2Publication Date: 2014-10-28
- Inventor: Sen Liu , Pushkara R. Varanasi
- Applicant: Sen Liu , Pushkara R. Varanasi
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agent L. Jeffrey Kelly; Yuanmin Cai
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/028 ; G03F7/26 ; C07C309/25 ; C07C309/26 ; C07D277/62 ; G03F7/029 ; C07D209/04 ; G03F7/039 ; G03F7/038 ; C07D261/20 ; C07D307/82
Abstract:
The present invention relates to a fluorine-free photoacid generator (PAG) and a photoresist composition containing the same. The PAG is characterized by the presence of an onium cationic component and a fluorine-free fused ring heteroaromatic sulfonate anionic component containing one or more electron withdrawing substituents. The onium cationic component of the PAG is preferably a sulfonium or an iodonium cation. The photoresist composition further contains an acid sensitive imaging polymer. The photoresist composition is especially useful for forming material patterns on a semiconductor substrate using 193 nm (ArF) lithography.
Public/Granted literature
- US20130011789A1 FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RESIST COMPOSITIONS CONTAINING THE SAME Public/Granted day:2013-01-10
Information query
IPC分类:
