发明授权
- 专利标题: Organoaminosilane precursors and methods for depositing films comprising same
- 专利标题(中): 有机氨基硅烷前体及其制备方法
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申请号: US13114287申请日: 2011-05-24
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公开(公告)号: US08912353B2公开(公告)日: 2014-12-16
- 发明人: Manchao Xiao , Mark Leonard O'Neill , Heather Regina Bowen , Hansong Cheng , Xinjian Lei
- 申请人: Manchao Xiao , Mark Leonard O'Neill , Heather Regina Bowen , Hansong Cheng , Xinjian Lei
- 申请人地址: US PA Allentown
- 专利权人: Air Products and Chemicals, Inc.
- 当前专利权人: Air Products and Chemicals, Inc.
- 当前专利权人地址: US PA Allentown
- 代理商 Rosaleen P. Morris-Oskanian
- 主分类号: C07F7/02
- IPC分类号: C07F7/02 ; C23C16/34 ; C23C16/40
摘要:
Described herein are precursors and methods of forming dielectric films. In one aspect, there is provided a silicon precursor having the following formula I: wherein R1 is independently selected from hydrogen, a linear or branched C1 to C6 alkyl, a linear or branched C2 to C6 alkenyl, a linear or branched C2 to C6 alkynyl, a C1 to C6 alkoxy, a C1 to C6 dialkylamino and an electron withdrawing group and n is a number selected from 0, 1, 2, 3, 4, and 5; and R2 is independently selected from hydrogen, a linear or branched C1 to C6 alkyl, a linear or branched C2 to C6 alkenyl, a linear or branched C2 to C6 alkynyl, a C1 to C6 alkoxy, a C1 to C6 dialkylamino, a C6 to C10 aryl, a linear or branched C1 to C6 fluorinated alkyl, and a C4 to C10 cyclic alkyl group.